The effect of drying rate on pattern collapse performance in thin film lithography

Dimension and process effects on the mechanical stability of ultra-small HSQ nanopillars

P Zeng, Z Feng, M Zheng, X Gao, S Zhang… - Journal of Nanoparticle …, 2021 - Springer
The demand for ever-smaller devices increases with the development of the semiconductor
industry. High-resolution patterning based on lithography is significant to fabricate ultra …
被引用次数：3 相关文章 所有 4 个版本