Nonvolatile ionic modification of the Dzyaloshinskii-Moriya interaction
The possibility of tuning the Dzyaloshinskii-Moriya interaction (DMI) by electric (E)-field
gating in ultrathin magnetic materials has opened up new perspectives in terms of …
gating in ultrathin magnetic materials has opened up new perspectives in terms of …
[图书][B] Radiation effects in semiconductors
K Iniewski - 2018 - taylorfrancis.com
Space applications, nuclear physics, military operations, medical imaging, and especially
electronics (modern silicon processing) are obvious fields in which radiation damage can …
electronics (modern silicon processing) are obvious fields in which radiation damage can …
Interactions of hydrogen with amorphous hafnium oxide
M Kaviani, VV Afanas' Ev, AL Shluger - Physical Review B, 2017 - APS
We used density functional theory (DFT) calculations to study the interaction of hydrogen
with amorphous hafnia (a-HfO 2) using a hybrid exchange-correlation functional. Injection of …
with amorphous hafnia (a-HfO 2) using a hybrid exchange-correlation functional. Injection of …
Interfacial oxide re-growth in thin film metal oxide III-V semiconductor systems
The Al 2 O 3/GaAs and HfO 2/GaAs interfaces after atomic layer deposition are studied using
in situ monochromatic x-ray photoelectron spectroscopy. Samples are deliberately exposed …
in situ monochromatic x-ray photoelectron spectroscopy. Samples are deliberately exposed …
Influence of hydrogen annealing on the properties of hafnium oxide thin films
MF Al-Kuhaili, SMA Durrani, IA Bakhtiari… - Materials Chemistry and …, 2011 - Elsevier
Thin films of hafnium oxide were deposited by electron beam evaporation, and were
subsequently annealed in hydrogen. X-ray diffraction, X-ray photoelectron spectroscopy …
subsequently annealed in hydrogen. X-ray diffraction, X-ray photoelectron spectroscopy …
Computational Study of the Hydrolysis Reactions of Small MO2 (M = Zr and Hf) Nanoclusters with Water
Z Fang, MD Outlaw, KK Smith, NW Gist… - The Journal of …, 2012 - ACS Publications
Density functional theory (DFT) has been used to study the hydrolysis reaction of (MO2) n
(M= Zr, Hf, n= 1–4) nanoclusters in the ground singlet and first triplet states. The reactions for …
(M= Zr, Hf, n= 1–4) nanoclusters in the ground singlet and first triplet states. The reactions for …
Effects of Switched-bias Annealing on Charge Trapping in HfO Gate Dielectrics
XJ Zhou, DM Fleetwood, L Tsetseris… - IEEE transactions on …, 2006 - ieeexplore.ieee.org
Charge trapping characteristics are investigated for MOS capacitors with 6.8 nm HfO 2
layers and 1.0 nm interfacial silicon oxynitrides; the effective oxide thickness of the high …
layers and 1.0 nm interfacial silicon oxynitrides; the effective oxide thickness of the high …
Interface trap density of gate-all-around silicon nanowire field-effect transistors with TiN gate: Extraction and compact model
Si/SiO 2 interface trap charge distribution of cylindrical cross-sectioned gate-all-around
silicon nanowire field-effect transistor is extracted by using three-dimensional simulation …
silicon nanowire field-effect transistor is extracted by using three-dimensional simulation …
The influence of surface preparation on low temperature HfO2 ALD on InGaAs (001) and (110) surfaces
Current logic devices rely on 3D architectures, such as the tri-gate field effect transistor
(finFET), which utilize the (001) and (110) crystal faces simultaneously thus requiring …
(finFET), which utilize the (001) and (110) crystal faces simultaneously thus requiring …
Oxygen species in HfO2 films: An in situ x-ray photoelectron spectroscopy study
C Driemeier, RM Wallace, IJR Baumvol - Journal of Applied Physics, 2007 - pubs.aip.org
The chemical bonding of O atoms in HfO 2 films on Si was investigated by in situ x-ray
photoelectron spectroscopy in the O 1 s spectral region. In addition to trivial O forming only O …
photoelectron spectroscopy in the O 1 s spectral region. In addition to trivial O forming only O …