Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)
A Anders - Journal of Applied Physics, 2017 - pubs.aip.org
High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines
magnetron sputtering with pulsed power concepts. By applying power in pulses of high …
magnetron sputtering with pulsed power concepts. By applying power in pulses of high …
Design of hard coatings deposited by HiPIMS and dcMS
Hard coatings are extensively used in various industries, including automotive, aerospace
and tooling industries. Hard coatings are deposited using, typically, chemical vapor …
and tooling industries. Hard coatings are deposited using, typically, chemical vapor …
Titanium nitride, TiXN (1− X), coatings deposited by HiPIMS for corrosion resistance and wear protection properties
The effect of nitrogen content on the structural, mechanical and corrosion properties of
titanium nitride (Ti x N 1− x) coatings deposited by high power impulse magnetron sputtering …
titanium nitride (Ti x N 1− x) coatings deposited by high power impulse magnetron sputtering …
Overcoming the insulating materials limitation in HiPIMS: Ion-assisted deposition of DLC coatings using bipolar HiPIMS
The present study aims to demonstrate that operating the HiPIMS discharge in bipolar
regime (BP-HiPIMS) enables an energy-enhanced deposition process of high-quality …
regime (BP-HiPIMS) enables an energy-enhanced deposition process of high-quality …
The effect of magnetic field configuration on structural and mechanical properties of TiN coatings deposited by HiPIMS and dcMS
The quality of coatings deposited by magnetron sputtering is known to depend on, among
others, the magnetic field strength (Φ) and the magnetic field configuration. Furthermore …
others, the magnetic field strength (Φ) and the magnetic field configuration. Furthermore …
[HTML][HTML] Improved film density for coatings at grazing angle of incidence in high power impulse magnetron sputtering with positive pulse
The production of a dense and void-free thin film on large and complex substrates is still a
challenge in Physical Vapor Deposition. High Power Impulse Magnetron Sputtering …
challenge in Physical Vapor Deposition. High Power Impulse Magnetron Sputtering …
Growth (AlCrNbSiTiV) N thin films on the interrupted turning and properties using DCMS and HIPIMS system
KS Chang, KT Chen, CY Hsu, PD Hong - Applied Surface Science, 2018 - Elsevier
This paper determines the optimal settings in the deposition parameters for (AlCrNbSiTiV) N
high-entropy alloy (HEAs) nitride films that are deposited on CBN cutting tools and glass …
high-entropy alloy (HEAs) nitride films that are deposited on CBN cutting tools and glass …
Deposition rate enhancement in HiPIMS through the control of magnetic field and pulse configuration
In high power impulse magnetron sputtering (HiPIMS) process, the magnetic field and
unbalance degree and pulsing configuration are key factors in controlling metal ionization …
unbalance degree and pulsing configuration are key factors in controlling metal ionization …
[HTML][HTML] Role of magnetic field and bias configuration on hipims deposition of w films
In this work, the deposition of tungsten (W) films by High Power Impulse Magnetron
Sputtering (HiPIMS) has been investigated. By adopting a combined modeling and …
Sputtering (HiPIMS) has been investigated. By adopting a combined modeling and …
[HTML][HTML] Recent progress on high power impulse magnetron sputtering (HiPIMS): The challenges and applications in fabricating VO2 thin film
H Zhang, JS Cherng, Q Chen - AIP Advances, 2019 - pubs.aip.org
High power impulse magnetron sputtering (HiPIMS) is well known in modern physical vapor
deposition (PVD) owing to its high peak power density, high degree of ionization, high …
deposition (PVD) owing to its high peak power density, high degree of ionization, high …