Historically, in the mass production of semiconductor devices, exposure tools have been
repeatedly replaced with those with a shorter wavelength to meet the resolution …

This new edition of the bestselling Microlithography: Science and Technology provides a
balanced treatment of theoretical and operational considerations, from elementary concepts …

Electron lithography at micrometer dimensions suffers from a seemingly fatal problem due to
proximity effects. Three corrections techniques are discussed. The self‐consistent technique …

Electron-Beam Technology in Microelectronic Fabrication presents a unified description of
the technology of high resolution lithography. This book is organized into six chapters, each …

In this the 50th anniversary year of the AVS and the AVS Symposium, this article is offered
as one in a series of topical review articles to celebrate the role of this community to the …

Electron beam lithography means writing patterns in thin films of electron sensitive material
using a finely focused (sub-micrometre diameter) electron beam. By combining electrical …

The interaction of an incident electron beam with resist films and substrates gives rise to an
electron distribution in the resist and which causes the so-called proximity effect in electron …

A three‐dimensional analysis is given of the generation, diffusion, and collection of minority
carriers injected by an electron beam in a semiconductor containing ap–n junction parallel …

Publisher Summary Electron beam-induced deposition (EBID) is a technique to directly
deposit structures on a target by the electron‐induced dissociation of adsorbed precursor …

The techniques of photolithography, electron lithography, X-ray lithography, ion
bombardment etching, and liftoff are reviewed, and their advantages and disadvantages …