Site-controlled and advanced epitaxial Ge/Si quantum dots: Fabrication, properties, and applications

M Brehm, M Grydlik - Nanotechnology, 2017 - iopscience.iop.org
In this review, we report on fabrication paths, challenges, and emerging solutions to
integrate group-IV epitaxial quantum dots (QDs) as active light emitters into the existing …

Seventy-five years since the point-contact transistor: Germanium revisited

EN Sgourou, A Daskalopulu, LH Tsoukalas… - Applied Sciences, 2022 - mdpi.com
The advent of the point-contact transistor is one of the most significant technological
achievements in human history with a profound impact on human civilization during the past …

[HTML][HTML] Trivalent Atom Defect-Complex Induced Defect Levels in Germanium for Enhanced Ge‑Based Device Performance

E Igumbor, M Dongho-Nguimdo, E Mapasha… - Journal of Electronic …, 2024 - Springer
Defect complexes have a significant impact on the structural, electronic, optical and
electrical properties of semiconductors. Several defect complexes formed by n-type and p …

[HTML][HTML] Defects in Ge and GeSn and their impact on optoelectronic properties

A Giunto, A Fontcuberta i Morral - Applied Physics Reviews, 2024 - pubs.aip.org
GeSn has emerged as a promising semiconductor with optoelectronic functionality in the
mid-infrared, with the potential of replacing expensive III–V technology for monolithic on-chip …

Evolution of phosphorus-vacancy clusters in epitaxial germanium

A Vohra, A Khanam, J Slotte, I Makkonen… - Journal of Applied …, 2019 - pubs.aip.org
The E centers (dopant-vacancy pairs) play a significant role in dopant deactivation in
semiconductors. In order to gain insight into dopant-defect interactions during epitaxial …

Dissolution of donor-vacancy clusters in heavily doped n-type germanium

S Prucnal, MO Liedke, X Wang, M Butterling… - New Journal of …, 2020 - iopscience.iop.org
The n-type doping of Ge is a self-limiting process due to the formation of vacancy-donor
complexes (D n V with n⩽ 4) that deactivate the donors. This work unambiguously …

Electrical compensation via vacancy–donor complexes in arsenic-implanted and laser-annealed germanium

T Kalliovaara, J Slotte, I Makkonen, J Kujala… - Applied Physics …, 2016 - pubs.aip.org
Highly n-type Ge attained by shallow As implantation and excimer laser annealing was
studied with positron annihilation spectroscopy and theoretical calculations. We conclude …

Electron concentration limit in Ge doped by ion implantation and flash lamp annealing

S Prucnal, J Żuk, R Hübner, J Duan, M Wang… - Materials, 2020 - mdpi.com
Controlled doping with an effective carrier concentration higher than 1020 cm− 3 is a key
challenge for the full integration of Ge into silicon-based technology. Such a highly doped …

Identification of point defects in multielement compounds and alloys with positron annihilation spectroscopy: Challenges and opportunities

F Tuomisto - physica status solidi (RRL)–Rapid Research …, 2021 - Wiley Online Library
Three topical materials systems are discussed from the point of view of point defect
characterization with positron annihilation spectroscopy. The family of III‐nitride …

Perspective on defect characterization in semiconductors by positron annihilation spectroscopy

I Makkonen, F Tuomisto - Journal of Applied Physics, 2024 - pubs.aip.org
This Perspective focuses on experimental and theoretical aspects of positron annihilation
spectroscopy. This set of methods is highly suitable for identifying and quantifying vacancy …