Applications of optical microcombs

Y Sun, J Wu, M Tan, X Xu, Y Li, R Morandotti… - Advances in Optics …, 2023 - opg.optica.org
Optical microcombs represent a new paradigm for generating laser frequency combs based
on compact chip-scale devices, which have underpinned many modern technological …

Photoelectrocatalytic materials for solar water splitting

T Yao, X An, H Han, JQ Chen… - Advanced Energy Materials, 2018 - Wiley Online Library
Photoelectrocatalytic water splitting offers a promising approach to convert sunlight into
sustainable hydrogen energy. A thorough understanding of the relationships between the …

Self-consistent optical constants of SiO2 and Ta2O5 films

LV Rodríguez-de Marcos, JI Larruquert… - Optical Materials …, 2016 - opg.optica.org
Self-consistent optical constants of SiO_2 and Ta_2O_5 films have been obtained for their
relevance in optical coatings from the near ultraviolet to the near infrared spectral ranges …

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

V Miikkulainen, M Leskelä, M Ritala… - Journal of Applied …, 2013 - pubs.aip.org
Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

RL Puurunen - Journal of applied physics, 2005 - pubs.aip.org
Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential
self-terminating gas–solid reactions, has for about four decades been applied for …

Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications

C Chaneliere, JL Autran, RAB Devine… - Materials Science and …, 1998 - Elsevier
This paper reviews the present knowledge on tantalum pentoxide (Ta2O5) thin films and
their applications in the field of microelectronics and integrated microtechnologies. Different …

Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

J Aarik, A Aidla, AA Kiisler, T Uustare, V Sammelselg - Thin Solid Films, 1999 - Elsevier
Atomic layer growth of hafnium dioxide from HfCl4 and H2O has been studied at substrate
temperatures ranging from 180–600° C. A quartz crystal microbalance was used for the real …

[图书][B] High k gate dielectrics

M Houssa - 2003 - books.google.com
The drive toward smaller and smaller electronic componentry has huge implications for the
materials currently being used. As quantum mechanical effects begin to dominate …

Nanoengineering and interfacial engineering of photovoltaics by atomic layer deposition

JR Bakke, KL Pickrahn, TP Brennan, SF Bent - Nanoscale, 2011 - pubs.rsc.org
Investment into photovoltaic (PV) research has accelerated over the past decade as
concerns over energy security and carbon emissions have increased. The types of PV …

Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films

SE Potts, W Keuning, E Langereis… - Journal of The …, 2010 - iopscience.iop.org
Many reported atomic layer deposition (ALD) processes are carried out at elevated
temperatures, which can be problematic for temperature-sensitive substrates. Plasma …