Applications of optical microcombs
Optical microcombs represent a new paradigm for generating laser frequency combs based
on compact chip-scale devices, which have underpinned many modern technological …
on compact chip-scale devices, which have underpinned many modern technological …
Photoelectrocatalytic materials for solar water splitting
T Yao, X An, H Han, JQ Chen… - Advanced Energy Materials, 2018 - Wiley Online Library
Photoelectrocatalytic water splitting offers a promising approach to convert sunlight into
sustainable hydrogen energy. A thorough understanding of the relationships between the …
sustainable hydrogen energy. A thorough understanding of the relationships between the …
Self-consistent optical constants of SiO2 and Ta2O5 films
LV Rodríguez-de Marcos, JI Larruquert… - Optical Materials …, 2016 - opg.optica.org
Self-consistent optical constants of SiO_2 and Ta_2O_5 films have been obtained for their
relevance in optical coatings from the near ultraviolet to the near infrared spectral ranges …
relevance in optical coatings from the near ultraviolet to the near infrared spectral ranges …
Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
V Miikkulainen, M Leskelä, M Ritala… - Journal of Applied …, 2013 - pubs.aip.org
Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …
suitable for depositing uniform and conformal films on complex three-dimensional …
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
RL Puurunen - Journal of applied physics, 2005 - pubs.aip.org
Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential
self-terminating gas–solid reactions, has for about four decades been applied for …
self-terminating gas–solid reactions, has for about four decades been applied for …
Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications
C Chaneliere, JL Autran, RAB Devine… - Materials Science and …, 1998 - Elsevier
This paper reviews the present knowledge on tantalum pentoxide (Ta2O5) thin films and
their applications in the field of microelectronics and integrated microtechnologies. Different …
their applications in the field of microelectronics and integrated microtechnologies. Different …
Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films
J Aarik, A Aidla, AA Kiisler, T Uustare, V Sammelselg - Thin Solid Films, 1999 - Elsevier
Atomic layer growth of hafnium dioxide from HfCl4 and H2O has been studied at substrate
temperatures ranging from 180–600° C. A quartz crystal microbalance was used for the real …
temperatures ranging from 180–600° C. A quartz crystal microbalance was used for the real …
[图书][B] High k gate dielectrics
M Houssa - 2003 - books.google.com
The drive toward smaller and smaller electronic componentry has huge implications for the
materials currently being used. As quantum mechanical effects begin to dominate …
materials currently being used. As quantum mechanical effects begin to dominate …
Nanoengineering and interfacial engineering of photovoltaics by atomic layer deposition
Investment into photovoltaic (PV) research has accelerated over the past decade as
concerns over energy security and carbon emissions have increased. The types of PV …
concerns over energy security and carbon emissions have increased. The types of PV …
Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films
SE Potts, W Keuning, E Langereis… - Journal of The …, 2010 - iopscience.iop.org
Many reported atomic layer deposition (ALD) processes are carried out at elevated
temperatures, which can be problematic for temperature-sensitive substrates. Plasma …
temperatures, which can be problematic for temperature-sensitive substrates. Plasma …