Defect engineering in SiC technology for high-voltage power devices

T Kimoto, H Watanabe - Applied Physics Express, 2020 - iopscience.iop.org
Major features of silicon carbide (SiC) power devices include high blocking voltage, low on-
state loss, and fast switching, compared with those of the Si counterparts. Through recent …

Review of silicon carbide processing for power MOSFET

C Langpoklakpam, AC Liu, KH Chu, LH Hsu, WC Lee… - Crystals, 2022 - mdpi.com
Owing to the superior properties of silicon carbide (SiC), such as higher breakdown voltage,
higher thermal conductivity, higher operating frequency, higher operating temperature, and …

Material science and device physics in SiC technology for high-voltage power devices

T Kimoto - Japanese Journal of Applied Physics, 2015 - iopscience.iop.org
Power semiconductor devices are key components in power conversion systems. Silicon
carbide (SiC) has received increasing attention as a wide-bandgap semiconductor suitable …

[HTML][HTML] Silicon carbide: A unique platform for metal-oxide-semiconductor physics

G Liu, BR Tuttle, S Dhar - Applied Physics Reviews, 2015 - pubs.aip.org
A sustainable energy future requires power electronics that can enable significantly higher
efficiencies in the generation, distribution, and usage of electrical energy. Silicon carbide …

[图书][B] Gallium nitride and silicon carbide power devices

BJ Baliga - 2016 - books.google.com
During the last 30 years, significant progress has been made to improve our understanding
of gallium nitride and silicon carbide device structures, resulting in experimental …

Generation of very fast states by nitridation of the SiO2/SiC interface

H Yoshioka, T Nakamura, T Kimoto - Journal of Applied Physics, 2012 - pubs.aip.org
Fast states at SiO 2/SiC interfaces annealed in NO at 1150–1350 C have been investigated.
The response frequency of the interface states was measured by the conductance method …

Preparation of hollow SiC spheres with biological template and research on its wave absorption properties

J Zhou, B Wei, Z Yao, H Lin, R Tan, W Chen… - Journal of Alloys and …, 2020 - Elsevier
In this work, SiO 2 was evenly coated on dry yeast as biological template by sol-gel method,
and the internal substances of yeast were removed at 700° C to obtain hollow silicon …

Interface Properties of 4H-SiC ( ) and ( ) MOS Structures Annealed in NO

S Nakazawa, T Okuda, J Suda… - … on Electron Devices, 2014 - ieeexplore.ieee.org
Interface properties of 4H-SiC (112̅0) and (11̅00) walls, the absence of junction FET
resistance, and the higher metal-oxide-semiconductor (MOS) structures annealed in nitric …

[HTML][HTML] High mobility 4H-SiC (0001) transistors using alkali and alkaline earth interface layers

DJ Lichtenwalner, L Cheng, S Dhar, A Agarwal… - Applied Physics …, 2014 - pubs.aip.org
Alkali (Rb and Cs) and alkaline earth (Ca, Sr, and Ba) elements have been investigated as
interface passivation materials for metal-oxide-semiconductor field-effect transistors …

Improvement of both n-and p-channel mobilities in 4H-SiC MOSFETs by high-temperature N₂ annealing

K Tachiki, T Kimoto - IEEE Transactions on Electron Devices, 2020 - ieeexplore.ieee.org
Effects of high-temperature (1400° C–1600° C) N 2 annealing on the interface states of 4H-
SiC/SiO 2 and the channel mobility of 4H-SiC metal–oxide–semiconductor field-effect …