This paper reviews the recent advances in reaction-ion etching (RIE) for application in high-
aspect-ratio microfabrication. High-aspect-ratio etching of materials used in micro-and …

Atomic layer etching (ALE) is a technique for removing thin layers of material using
sequential reaction steps that are self-limiting. ALE has been studied in the laboratory for …

This review provides an overview of area-selective thin film deposition (ASD) with a primary
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …

The field of plasma etching is reviewed. Plasma etching, a revolutionary extension of the
technique of physical sputtering, was introduced to integrated circuit manufacturing as early …

High aspect ratio (HAR) silicon etch is reviewed, including commonly used terms, history,
main applications, different technological methods, critical challenges, and main theories of …

The ability to achieve near-atomic precision in etching different materials when transferring
lithographically defined templates is a requirement of increasing importance for nanoscale …

The generation of dissipative Kerr solitons in optical microresonators has provided a route to
compact frequency combs of high repetition rate, which have already been employed for …

Bit-patterned media (BPM) for magnetic recording provides a route to thermally stable data
recording at> 1 Tb/in 2 and circumvents many of the challenges associated with extending …

We report on fabrication of high-confinement and low loss silicon nitride (Si 3 N 4)
waveguides using the photonic Damascene process. This process scheme represents a …

MEMs Materials and Processes Handbook" is a comprehensive reference for researchers
searching for new materials, properties of known materials, or specific processes available …