Growth, stress and hardness of reactively sputtered tungsten nitride thin films
M Wen, QN Meng, WX Yu, WT Zheng, SX Mao… - Surface and Coatings …, 2010 - Elsevier
Tungsten nitride (WNx) thin films were deposited on Si (100) substrates using direct current
reactive magnetron sputtering in discharging a mixture of N2 and Ar gas. The effects of …
reactive magnetron sputtering in discharging a mixture of N2 and Ar gas. The effects of …
Cubic β-WNx layers: Growth and properties vs N-to-W ratio
BD Ozsdolay, CP Mulligan, K Balasubramanian… - Surface and Coatings …, 2016 - Elsevier
Abstract Tungsten nitride layers, 1.45-μm-thick, were deposited by reactive magnetron
sputtering on MgO (001), MgO (111), and Al 2 O 3 (0001) in 20 mTorr N 2 at T s= 500–800° …
sputtering on MgO (001), MgO (111), and Al 2 O 3 (0001) in 20 mTorr N 2 at T s= 500–800° …
Tribological characterization of tungsten nitride coatings deposited by reactive magnetron sputtering
T Polcar, NMG Parreira, A Cavaleiro - Wear, 2007 - Elsevier
The structure, hardness, friction and wear of tungsten nitrides prepared by dc reactive
magnetron sputtering were investigated. The coatings were deposited with different nitrogen …
magnetron sputtering were investigated. The coatings were deposited with different nitrogen …
Chemical and structural characterization of tungsten nitride (WNx) thin films synthesized via Gas Injection Magnetron Sputtering technique
B Wicher, R Chodun, K Nowakowska-Langier… - Vacuum, 2019 - Elsevier
Tungsten nitride (WN x) thin films were synthesized on the silicon substrates by way of Gas
Injection Magnetron Sputtering (GIMS) technique. Pulsed discharge conditions, generated in …
Injection Magnetron Sputtering (GIMS) technique. Pulsed discharge conditions, generated in …
Influence of process parameters on properties of reactively sputtered tungsten nitride thin films
ML Addonizio, A Castaldo, A Antonaia… - Journal of Vacuum …, 2012 - pubs.aip.org
Tungsten nitride (WN x) thin films were produced by reactive dc magnetron sputtering of
tungsten in an Ar–N 2 gas mixture. The influence of the deposition power on the properties …
tungsten in an Ar–N 2 gas mixture. The influence of the deposition power on the properties …
The effect of bilayer period and degree of unbalancing on magnetron sputtered Cr/CrN nano-multilayer wear and corrosion
DM Marulanda, JJ Olaya, U Piratoba, A Mariño… - Thin Solid Films, 2011 - Elsevier
Cr/CrN nano-multilayers were grown on H13 steel and silicon (100), having different periods
(Λ), at room temperature using the unbalanced magnetron sputtering technique by varying …
(Λ), at room temperature using the unbalanced magnetron sputtering technique by varying …
Impact of Ar Flow Rates on Micro-Structural Properties of WS2 Thin Film by RF Magnetron Sputtering
Tungsten disulfide (WS2) thin films were deposited on soda-lime glass (SLG) substrates
using radio frequency (RF) magnetron sputtering at different Ar flow rates (3 to 7 sccm). The …
using radio frequency (RF) magnetron sputtering at different Ar flow rates (3 to 7 sccm). The …
Tungsten carbides and nitrides and ternary systems based on them: the electronic structure, chemical bonding and properties
DV Suetin, IR Shein, AL Ivanovskii - Russian Chemical Reviews, 2010 - iopscience.iop.org
The review is concerned with analysis of the results of modern ab initio studies on the
electronic structure, the nature of chemical bonding and some physicochemical properties of …
electronic structure, the nature of chemical bonding and some physicochemical properties of …
Investigation of monolayer–multilayer PVD nitride coating
RK Upadhyay, LA Kumaraswamidhas - Surface Engineering, 2015 - journals.sagepub.com
A thin monolayer and multilayer physical vapour deposition film was prepared on tool steel
substrates using an unbalanced magnetron sputtering technique. Characteristics of …
substrates using an unbalanced magnetron sputtering technique. Characteristics of …
Characterization of sputtered tungsten nitride film and its application to Cu electroless plating
Z Wang, Z Liu, Z Yang, S Shingubara - Microelectronic Engineering, 2008 - Elsevier
In this study, W and tungsten nitride films were fabricated by reactive sputtering in a N2/Ar
atmosphere, the native oxide growth on the surface of the tungsten nitride films was …
atmosphere, the native oxide growth on the surface of the tungsten nitride films was …