This paper is a sequel to the 1998 review paper “Scientific status of the Dense Plasma
Focus” with 16 authors belonging to 16 nations, whose initiative led to the establishment of …

Low-temperature (<; 10 eV) plasmas with densities varying over a very wide range from 10
13 m-3 at the lower end to as high as 10 23 m-3 have firmly established themselves as one …

The dense plasma focus (DPF), a coaxial plasma gun, utilizes pulsed high current electrical
discharge to heat and compress the plasma to very high density and temperature with …

The study investigates the spectral characteristics of a DC glow discharge generated in a
parallel electrode configuration for nitriding the Ti-6Al-4V alloy to enhance its surface …

The nitridation of zirconium disks is achieved by irradiating energetic nitrogen ions from 2.3
kJ plasma focus device using multiple focus deposition shots (10, 20, 30 and 40) at different …

The present work reports the results of TiN-ions implantation into the SS316L samples as
bipolar plates by a 4 kJ Mather type Plasma Focus (PF) device operated with nitrogen gas …

Nanocrystalline zirconium carbonitride (ZrCN) composite films were deposited on zirconium
substrates for multiple (10, 20, 30, 40 and 50) focus shots. X-ray diffraction analysis shows …

We report the successful deposition of nano-phase crystalline titanium dioxide (TiO2) thin
films using a repetitive plasma focus device on silicon (Si) substrates at room temperature …

Tungsten nitride thin films were deposited on stainless steel–304 substrates by using a low
energy (2 kJ) Mather type plasma focus device. X-ray diffraction (XRD), scanning electron …

Zirconium aluminium oxynitride multiphase composite film is deposited on zirconium
substrate using energetic nitrogen ions delivered from dense plasma Focus device. X-ray …