An aluminum-based hybrid film photoresist for advanced lithography by molecular layer deposition
In the realm of advanced integrated circuits, the demand for novel resist materials becomes
paramount as we progress toward smaller process nodes. Inorganic photoresists have …
paramount as we progress toward smaller process nodes. Inorganic photoresists have …
Heteroepitaxy of Ge on Si (001) with pits and windows transferred from free-standing porous alumina mask
This paper reports the use of ultrathin free-standing porous alumina membrane (PAM) in
pattern transferring for selective epitaxial growth (SEG) of Ge dots and films on Si. PAM, as a …
pattern transferring for selective epitaxial growth (SEG) of Ge dots and films on Si. PAM, as a …
Restrictions of Si-based Ge nanodots from porous alumina membranes
This paper reports growth of ordered Ge nanodots (NDs) with uniform sizes on silicon
substrates using porous alumina membranes (PAMs) as templates. The relationships …
substrates using porous alumina membranes (PAMs) as templates. The relationships …