Recent advances in Si-compatible nanostructured photodetectors

R Douhan, K Lozovoy, A Kokhanenko, H Deeb, V Dirko… - Technologies, 2023 - mdpi.com
In this review the latest advances in the field of nanostructured photodetectors are
considered, stating the types and materials, and highlighting the features of operation …

Tuning the structural and optical properties of GeSiSn/Si multiple quantum wells and GeSn nanostructures using annealing and a faceted surface as a substrate

VA Timofeev, VI Mashanov, AI Nikiforov… - Applied Surface …, 2022 - Elsevier
The optical properties of GeSiSn/Si multiple quantum wells (MQWs) and GeSn
nanostructures are studied in the range of 1.3–4 µm. An annealing at the temperature of …

High-resolution RHEED analysis of dynamics of low-temperature superstructure transitions in Ge/Si (001) epitaxial system

VV Dirko, KA Lozovoy, AP Kokhanenko… - …, 2021 - iopscience.iop.org
In this paper, we analyze superstructural transitions during epitaxial growth of two-
dimensional layers and the formation of quantum dots by the Stranski–Krastanov …

Thickness-dependent elastic strain in Stranski–Krastanow growth

VV Dirko, KA Lozovoy, AP Kokhanenko… - Physical Chemistry …, 2020 - pubs.rsc.org
In this paper, we comprehensively consider the effect of the dependence of elastic strain on
the thickness of deposited material on the formation of two-dimensional layers and quantum …

Studying the morphology, structure and band diagram of thin GeSiSn films and their mid-infrared photoresponse

V Timofeev, A Nikiforov, A Yakimov… - Semiconductor …, 2018 - iopscience.iop.org
The initial stages of Ge 1− x− y Si x Sn y film growth on Ge substrate were investigated and
the kinetic diagram of the morphological state for GeSiSn films was built. The kinetic diagram …

Peculiarities of the 7× 7 to 5× 5 superstructure transition during epitaxial growth of germanium on silicon (111) surface

VV Dirko, KA Lozovoy, AP Kokhanenko, OI Kukenov… - Nanomaterials, 2023 - mdpi.com
This paper presents the results of studying the processes of epitaxial growth of germanium
on silicon with crystallographic orientation (111) in a wide temperature range. The …

Enabling Type I Lattice-Matched Heterostructures in SiGeSn Alloys Through Engineering Composition and Short-Range Order: A First-Principles Perspective

X Jin, S Chen, T Li - IEEE Journal of Selected Topics in …, 2024 - ieeexplore.ieee.org
Tuning the composition in group IV alloys can significantly change their electronic structures,
enabling a broad range of properties for electronic, photonic, and topological applications …

The impact of strained layers on current and emerging semiconductor laser systems

SJ Sweeney, TD Eales, AR Adams - Journal of Applied Physics, 2019 - pubs.aip.org
In this paper, we discuss how the deliberate and controlled introduction of strain can be
used to improve the performance of semiconductor lasers. We show how strain-induced …

Evolution of epitaxial quantum dots formed by Volmer–Weber growth mechanism

KA Lozovoy, AP Kokhanenko, VV Dirko… - Crystal Growth & …, 2019 - ACS Publications
Germanium/silicon systems are among the most promising materials for development of
current semiconductor electronics and photonics. Structures with germanium quantum dots …

Epitaxial growth of peculiar GeSn and SiSn nanostructures using a Sn island array as a seed

V Timofeev, V Mashanov, A Nikiforov… - Applied Surface …, 2021 - Elsevier
The regularities of the GeSn and SiSn nanostructure formation on Si and Ge (1 0 0)
substrates on the vapor–liquid-crystal mechanism were studied. It was shown that either …