Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be
finely tuned via block architecture and processing conditions. However, the ultimate usage …

Nanoscale fabrication of smart materials relying on the molecular self‐assembly of block
copolymers (BCPs) has been recognized as a valuable platform for various next‐generation …

Despite the remarkable advances made in the development of 2D perovskites suitable for
various high‐performance devices, the development of sub‐30 nm nanopatterns of 2D …

One of the fundamental challenges encountered in successful incorporation of directed self‐
assembly in sub‐10 nm scale practical nanolithography is the process compatibility of block …

Block copolymers of polyisoprene and polystyrene are key materials for polymer
nanostructures as well as for several commercially established thermoplastic elastomers. In …

The block copolymer (BCP) approach is a promising route for sub-10 nm semiconductor
lithography. In this paper, a series of polystyrene-block-poly (pentadecafluorooctyl …

As the demand for diverse nanostructures in physical/chemical devices continues to rise, the
development of nanotransfer printing (nTP) technology is receiving significant attention due …

The precisely controllable self‐assembly phenomenon of block copolymers (BCPs) has
garnered much attention because it yields well‐defined periodic nanostructures with a …

Directed self-assembly (DSA) of block copolymers (BCPs) with a high Flory–Huggins
interaction parameter (χ) provides advantages of pattern size reduction below 10 nm and …

Self-assembly of block copolymers (BCPs) provides an attractive nanolithography approach,
which looks especially promising for fabrication of regular structures with characteristic sizes …