Plasma nanoscience: setting directions, tackling grand challenges

KK Ostrikov, U Cvelbar, AB Murphy - Journal of Physics D …, 2011 - iopscience.iop.org
This review paper presents historical perspectives, recent advances and future directions in
the multidisciplinary research field of plasma nanoscience. The current status and future …

A review of plasma-induced defects: detection, kinetics and advanced management

S Nunomura - Journal of Physics D: Applied Physics, 2023 - iopscience.iop.org
Plasma-induced defects are often recognized in state-of-the-art semiconductors, high-
efficiency solar cells and high-sensitivity image sensors. These defects are in the form of a …

Dense plasma focus-from alternative fusion source to versatile high energy density plasma source for plasma nanotechnology

RS Rawat - Journal of Physics: Conference Series, 2015 - iopscience.iop.org
The dense plasma focus (DPF), a coaxial plasma gun, utilizes pulsed high current electrical
discharge to heat and compress the plasma to very high density and temperature with …

High-energy-density pinch plasma: A unique nonconventional tool for plasma nanotechnology

RS Rawat - IEEE Transactions on Plasma Science, 2013 - ieeexplore.ieee.org
Low-temperature (<; 10 eV) plasmas with densities varying over a very wide range from 10
13 m-3 at the lower end to as high as 10 23 m-3 have firmly established themselves as one …

Recent advances in vacuum sciences and applications

M Mozetič, K Ostrikov, DN Ruzic… - Journal of Physics D …, 2014 - iopscience.iop.org
Recent advances in vacuum sciences and applications are reviewed. Novel optical
interferometer cavity devices enable pressure measurements with ppm accuracy. The …

Size and flux of carbon nanoparticles synthesized by Ar+ CH4 multi-hollow plasma chemical vapor deposition

SH Hwang, T Okumura, K Kamataki, N Itagaki… - Diamond and Related …, 2020 - Elsevier
Carbon nanoparticles (CNPs) were synthesized using Ar+ CH 4 multi-hollow plasma
chemical vapor deposition. The deposition flux of CNPs to a substrate was studied as a …

Generation and applications of plasma (an academic review)

F Mehmood, T Kamal, U Ashraf - 2018 - preprints.org
Plasma being the fourth and most abundant form of matter extensively exists in the universe
in the inter-galactic regions. It provides an electrically neutral medium of unbound negative …

In situ analysis of size distribution of nano-particles in reactive plasmas using two dimensional laser light scattering method

K Kamataki, Y Morita, M Shiratani, K Koga… - Journal of …, 2012 - iopscience.iop.org
We have developed a simple in-situ method for measuring the size distribution (the mean
size (mean diameter) and size dispersion) of nano-particles generated in reactive plasmas …

[HTML][HTML] Effects of carbon nanoparticle insertion on stress reduction in hydrogenated amorphous carbon films using plasma chemical vapor deposition

S Ono, SH Hwang, T Okumura, N Yamashita… - Diamond and Related …, 2024 - Elsevier
Stress reduction in hydrogenated amorphous carbon (aC: H) films is of considerable interest
for improving their performance as protective films. Herein, we reduced the compressive …

Gas‐Phase Plasma Synthesis of Free‐Standing Silicon Nanoparticles for Future Energy Applications

İ Doğan, MCM van de Sanden - Plasma Processes and …, 2016 - Wiley Online Library
Silicon nanoparticles (Si‐NPs) are considered as possible candidates for a wide spectrum of
future technological applications. Research in the last decades has shown that plasmas are …