Silicon compound nanomaterials: Exploring emission mechanisms and photobiological applications
After the first visible photoluminescence (PL) from porous silicon (pSi), continuous efforts are
made to fabricate Si‐based compound nanomaterials embedded in matrices such as oxide …
made to fabricate Si‐based compound nanomaterials embedded in matrices such as oxide …
Design and optimization of single, double and multilayer anti-reflection coatings on planar and textured surface of silicon solar cells
M Valiei, PM Shaibani, H Abdizadeh… - Materials Today …, 2022 - Elsevier
The present silicon solar cell industry's main concern is to increase efficiency by minimizing
the surface reflection. As a result, lately, much attention has been paid to the composition …
the surface reflection. As a result, lately, much attention has been paid to the composition …
Antireflection enhancement by composite nanoporous zeolite 3A–carbon thin film
M Stetsenko, SA Pullano, T Margitych, L Maksimenko… - Nanomaterials, 2019 - mdpi.com
A straightforward and effective spin-coating technique at 120° C was investigated for the
deposition of a thin nanoporous layer with antireflection properties onto glass and indium tin …
deposition of a thin nanoporous layer with antireflection properties onto glass and indium tin …
Characterization of light induced degradation in PECVD silicon nitride passivated Cz silicon wafers using spectroscopic techniques
In this work we investigate the chemical species involved in the light induced degradation of
plasma enhanced chemical vapor deposited (PECVD) hydrogenated silicon nitride (SiN x …
plasma enhanced chemical vapor deposited (PECVD) hydrogenated silicon nitride (SiN x …
Exploring low temperature-sputtered indium tin oxide (ITO) as an anti-reflection layer for silicon solar cells
This paper tackles challenges in silicon (Si) solar cells, specifically the use of hazardous
Phosphorus Oxychloride (POCl 3) for emitter formation and silane/ammonia for the Anti …
Phosphorus Oxychloride (POCl 3) for emitter formation and silane/ammonia for the Anti …
硅, 氮共掺杂碳点荧光粉的制备及发光性能.
孟丹， 郑开元， 陈珊珊， 卓钊龙… - Chinese Journal of …, 2022 - search.ebscohost.com
摘要采用N-苯基对苯二胺和3-氨基丙基三甲氧基硅烷为原料, 通过光化学催化法合成了高荧光
强度的硅, 氮共掺杂碳点(Si/N-CDs). 通过透射电子显微镜(TEM), X 射线光电子能谱(XPS) …
强度的硅, 氮共掺杂碳点(Si/N-CDs). 通过透射电子显微镜(TEM), X 射线光电子能谱(XPS) …
A new passivation scheme for the performance enhancement of black silicon solar cells
C Ramos, Y Verduzco-López, C Álvarez-Macías… - Materials Today …, 2019 - Elsevier
It is well known that, in c-Si solar cells, the surface treatments are very important and have
great relevance in the final efficiency of the devices. Black silicon solar cells are the …
great relevance in the final efficiency of the devices. Black silicon solar cells are the …
Effect of RF sputtering process parameters on silicon nitride thin film deposition
SS Bharadwaj, GR Rajkumar, BW Shivaraj… - arXiv preprint arXiv …, 2017 - arxiv.org
The objective of this work was to study the RF sputtering process parameters optimisation for
deposition of Silicon Nitride thin films. The process parameters chosen to be varied were …
deposition of Silicon Nitride thin films. The process parameters chosen to be varied were …