The thermophoretic effect of particle deposition on a free standing wafer was studied
experimentally and numerically. The experimental study consisted of generating a …

A three-dimensional Monte Carlo model was developed to simulate the deposition of
aerosol particles onto horizontal solid surfaces. The random walk method was employed to …

Crew LLP 57 ABSTRACT The present invention provides methods and apparatus for
reducing particulate contamination during the processing of a Substrate. In one …

Publisher Summary This chapter explores basics and sampling of particles for size analysis
and identi? cation. Contamination in particle form can originate from the facility, from tooling …

A practical" how to" guide that effectively deals with the control of both contamination and
ESD This book offers effective strategies and techniques for contamination and electrostatic …

Transmission measurements have been performed on University Research Glassware, Inc.
model 2000–30B glass annular denuders at 10 L/min using monodisperse particles in the …

Extreme ultraviolet lithography (EUVL) is considered as the next generation lithography for
32-nm-node or smaller in semiconductor manufacturing. One of the challenges is to protect …

In this study, the phenomenon of particulate contamination of heated wafers contained in a
closed environment like the front opening unified pod (FOUP), which is a fundamental …

This article discusses the mechanisms of particle deposition onto cleanroom surfaces. The
main mechanism for particles above about 0.5 μm is gravitational settling. Turbulent …

The Gaussian Diffusion Sphere Model (GDSM) was developed and improved to reflect the
effects of gravitational settling as well as Brownian diffusion of aerosol particles on …