A kinetic analysis of residual stress evolution in polycrystalline thin films
E Chason - Thin Solid Films, 2012 - Elsevier
Residual stress is a longstanding problem in thin film growth that affects film performance
and limits the range of applicability. A better understanding of why this stress develops and …
and limits the range of applicability. A better understanding of why this stress develops and …
[HTML][HTML] Structure-zone modeling of sputter-deposited thin films: a brief review
E Kusano - Applied Science and Convergence Technology, 2019 - e-asct.org
In this paper, the structure zone model (SZM) for sputter-deposited thin films is reviewed
through a systematic discussion of the dependence of film structure and properties on the …
through a systematic discussion of the dependence of film structure and properties on the …
Characterization of Nanoscale Mechanical Heterogeneity in a Metallic Glass<? format?> by Dynamic Force Microscopy
We report nanoscale mechanical heterogeneity of a metallic glass characterized by dynamic
force microscopy. Apparent energy dissipation with a variation of∼ 12%, originating from …
force microscopy. Apparent energy dissipation with a variation of∼ 12%, originating from …
Investigating the effect of nitrogen on the structural and tribo-mechanical behavior of vanadium nitride thin films deposited using RF magnetron sputtering
Magnetron sputtering is one of the most commonly used deposition techniques, which has
received considerable attention in industrial applications. In particular, owing to its …
received considerable attention in industrial applications. In particular, owing to its …
Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering
Y Lv, L Ji, X Liu, H Li, H Zhou, J Chen - Applied Surface Science, 2012 - Elsevier
The CrAlN films were deposited on silicon and stainless steel substrates by unbalanced
magnetron sputtering system. The influence of substrate bias on deposition rate …
magnetron sputtering system. The influence of substrate bias on deposition rate …
Probing the composition dependence of residual stress distribution in tungsten-titanium nanocrystalline thin films
RJ Sinojiya, P Paulachan, FF Chamasemani… - Communications …, 2023 - nature.com
Nanocrystalline alloy thin films offer a variety of attractive properties, such as high hardness,
strength and wear resistance. A disadvantage is the large residual stresses that result from …
strength and wear resistance. A disadvantage is the large residual stresses that result from …
Dynamic high energy density plasma environments at the National Ignition Facility for nuclear science research
CJ Cerjan, L Bernstein, LB Hopkins… - Journal of Physics G …, 2018 - iopscience.iop.org
The generation of dynamic high energy density plasmas in the pico-to nano-second time
domain at high-energy laser facilities affords unprecedented nuclear science research …
domain at high-energy laser facilities affords unprecedented nuclear science research …
Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films
HfO 2 thin films were deposited by electron beam evaporation technique at different oxygen
(O 2) partial pressures. The films are characterized using x-ray diffraction, x-ray reflectivity …
(O 2) partial pressures. The films are characterized using x-ray diffraction, x-ray reflectivity …
In-situ monitoring of stress evolution in high power impulse magnetron sputtering-deposited Ti-Al-N films: Effect of substrate bias and temperature
The origin of residual stress during film deposition is a topic of strong interest in the coating
engineering community; it requires appropriate investigation tools to explain the different …
engineering community; it requires appropriate investigation tools to explain the different …
Effect of O2/Ar gas flow ratio on the optical properties and mechanical stress of sputtered HfO2 thin films
HfO 2 thin films have been deposited on BK7 glass substrate by reactive RF sputtering
technique at different oxygen/argon (O 2/Ar) gas flow ratios. The films are polycrystalline in …
technique at different oxygen/argon (O 2/Ar) gas flow ratios. The films are polycrystalline in …