A kinetic analysis of residual stress evolution in polycrystalline thin films

E Chason - Thin Solid Films, 2012 - Elsevier
Residual stress is a longstanding problem in thin film growth that affects film performance
and limits the range of applicability. A better understanding of why this stress develops and …

[HTML][HTML] Structure-zone modeling of sputter-deposited thin films: a brief review

E Kusano - Applied Science and Convergence Technology, 2019 - e-asct.org
In this paper, the structure zone model (SZM) for sputter-deposited thin films is reviewed
through a systematic discussion of the dependence of film structure and properties on the …

Characterization of Nanoscale Mechanical Heterogeneity in a Metallic Glass<? format?> by Dynamic Force Microscopy

YH Liu, D Wang, K Nakajima, W Zhang, A Hirata… - Physical review …, 2011 - APS
We report nanoscale mechanical heterogeneity of a metallic glass characterized by dynamic
force microscopy. Apparent energy dissipation with a variation of∼ 12%, originating from …

Investigating the effect of nitrogen on the structural and tribo-mechanical behavior of vanadium nitride thin films deposited using RF magnetron sputtering

L Aissani, M Fellah, AH Chadli, MA Samad… - Journal of Materials …, 2021 - Springer
Magnetron sputtering is one of the most commonly used deposition techniques, which has
received considerable attention in industrial applications. In particular, owing to its …

Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

Y Lv, L Ji, X Liu, H Li, H Zhou, J Chen - Applied Surface Science, 2012 - Elsevier
The CrAlN films were deposited on silicon and stainless steel substrates by unbalanced
magnetron sputtering system. The influence of substrate bias on deposition rate …

Probing the composition dependence of residual stress distribution in tungsten-titanium nanocrystalline thin films

RJ Sinojiya, P Paulachan, FF Chamasemani… - Communications …, 2023 - nature.com
Nanocrystalline alloy thin films offer a variety of attractive properties, such as high hardness,
strength and wear resistance. A disadvantage is the large residual stresses that result from …

Dynamic high energy density plasma environments at the National Ignition Facility for nuclear science research

CJ Cerjan, L Bernstein, LB Hopkins… - Journal of Physics G …, 2018 - iopscience.iop.org
The generation of dynamic high energy density plasmas in the pico-to nano-second time
domain at high-energy laser facilities affords unprecedented nuclear science research …

Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films

S Jena, RB Tokas, S Tripathi, KD Rao… - Journal of Alloys and …, 2019 - Elsevier
HfO 2 thin films were deposited by electron beam evaporation technique at different oxygen
(O 2) partial pressures. The films are characterized using x-ray diffraction, x-ray reflectivity …

In-situ monitoring of stress evolution in high power impulse magnetron sputtering-deposited Ti-Al-N films: Effect of substrate bias and temperature

PRT Avila, O Zabeida, LB Varela… - Thin Solid Films, 2023 - Elsevier
The origin of residual stress during film deposition is a topic of strong interest in the coating
engineering community; it requires appropriate investigation tools to explain the different …

Effect of O2/Ar gas flow ratio on the optical properties and mechanical stress of sputtered HfO2 thin films

S Jena, RB Tokas, JS Misal, KD Rao, DV Udupa… - Thin Solid Films, 2015 - Elsevier
HfO 2 thin films have been deposited on BK7 glass substrate by reactive RF sputtering
technique at different oxygen/argon (O 2/Ar) gas flow ratios. The films are polycrystalline in …