Laser-induced damage thresholds of bulk and coating optical materials at 1030 nm, 500 fs
L Gallais, M Commandré - Applied optics, 2014 - opg.optica.org
We report on extensive femtosecond laser damage threshold measurements of optical
materials in both bulk and thin-film form. This study, which is based on published and new …
materials in both bulk and thin-film form. This study, which is based on published and new …
Structure and optical properties of nanocrystalline hafnium oxide thin films
Hafnium oxide (HfO 2) films were grown by sputter-deposition by varying deposition
temperature (T s) in a wide range of 25–700° C. The deposited HfO 2 films were …
temperature (T s) in a wide range of 25–700° C. The deposited HfO 2 films were …
High temperature annealing effects on spectral, microstructural and laser damage resistance properties of sputtered HfO2 and HfO2-SiO2 mixture-based UV mirrors
G Abromavičius, S Kičas, R Buzelis - Optical Materials, 2019 - Elsevier
Hafnium oxide is widely used as high refractive index material for making high power laser
coatings for UV spectral range. Thermal annealing is one of the most efficient post …
coatings for UV spectral range. Thermal annealing is one of the most efficient post …
Temperature-Dependent HfO2/Si Interface Structural Evolution and its Mechanism
In this work, hafnium oxide (HfO 2) thin films are deposited on p-type Si substrates by remote
plasma atomic layer deposition on p-type Si at 250° C, followed by a rapid thermal …
plasma atomic layer deposition on p-type Si at 250° C, followed by a rapid thermal …
Properties of atomic layer deposited HfO2 thin films
JC Hackley, T Gougousi - Thin Solid Films, 2009 - Elsevier
The growth, composition and morphology of HfO2 films that have been deposited by atomic
layer deposition (ALD) are examined in this article. The films are deposited using two …
layer deposition (ALD) are examined in this article. The films are deposited using two …
Broadband pulse compression gratings with measured 99.7% diffraction efficiency
M Rumpel, M Moeller, C Moormann, T Graf… - Optics Letters, 2014 - opg.optica.org
We present experimental investigations of grating mirrors with high diffraction efficiencies
exceeding 99.7% in the− 1st order for TE polarization at a wavelength of 1060 nm, and …
exceeding 99.7% in the− 1st order for TE polarization at a wavelength of 1060 nm, and …
A high accuracy femto-/picosecond laser damage test facility dedicated to the study of optical thin films
A laser damage test facility delivering pulses from 100 fs to 3 ps and designed to operate at
1030 nm is presented. The different details of its implementation and performances are …
1030 nm is presented. The different details of its implementation and performances are …
[HTML][HTML] ICF 激光驱动装置用大尺寸激光薄膜元件
朱美萍， 孙建， 李静平， 易葵， 邵建达 - Chinese Journal of Lasers, 2024 - opticsjournal.net
摘要大尺寸高功率激光薄膜元件是我国神光系列等大型激光装置中的关键元件,
常采用电子束蒸发技术, 在高质量光学玻璃基底表面, 通过交替沉积两种或多种材料制备而成 …
常采用电子束蒸发技术, 在高质量光学玻璃基底表面, 通过交替沉积两种或多种材料制备而成 …
Laser-induced damage of hafnia coatings as a function of pulse duration in the femtosecond to nanosecond range
Laser-damage thresholds and morphologies of hafnia single layers exposed under
femtosecond, picosecond, and nanosecond single pulses (1030/1064nm) are reported. The …
femtosecond, picosecond, and nanosecond single pulses (1030/1064nm) are reported. The …
Nano-imprint lithography of broad-band and wide-angle antireflective structures for high-power lasers
M Modaresialam, N Granchi, M Stehlik, C Petite… - Optics …, 2024 - opg.optica.org
We demonstrate efficient anti reflection coatings based on adiabatic index matching
obtained via nano-imprint lithography. They exhibit high total transmission, achromaticity …
obtained via nano-imprint lithography. They exhibit high total transmission, achromaticity …