Stress in thin films and coatings: Current status, challenges, and prospects
The issue of stress in thin films and functional coatings is a persistent problem in materials
science and technology that has congregated many efforts, both from experimental and …
science and technology that has congregated many efforts, both from experimental and …
[HTML][HTML] Conductive nitrides: Growth principles, optical and electronic properties, and their perspectives in photonics and plasmonics
The nitrides of most of the group IVb-Vb-VIb transition metals (TiN, ZrN, HfN, VN, NbN, TaN,
MoN, WN) constitute the unique category of conductive ceramics. Having substantial …
MoN, WN) constitute the unique category of conductive ceramics. Having substantial …
Enhancement of calcium copper titanium oxide photoelectrochemical performance using boron nitride nanosheets
Photoelectrochemical water splitting under visible light has attracted attention for renewable
hydrogen production. Despite prevalent investigations, many challenges still hindered an …
hydrogen production. Despite prevalent investigations, many challenges still hindered an …
[HTML][HTML] A kinetic model for stress generation in thin films grown from energetic vapor fluxes
We have developed a kinetic model for residual stress generation in thin films grown from
energetic vapor fluxes, encountered, eg, during sputter deposition. The new analytical …
energetic vapor fluxes, encountered, eg, during sputter deposition. The new analytical …
Benefits of energetic ion bombardment for tailoring stress and microstructural evolution during growth of Cu thin films
F Cemin, G Abadias, T Minea, C Furgeaud, F Brisset… - Acta Materialia, 2017 - Elsevier
We have studied the development of intrinsic stress and microstructure of copper (Cu) films
deposited under energetic ion bombardment. Stress evolution during growth of∼ 150 nm …
deposited under energetic ion bombardment. Stress evolution during growth of∼ 150 nm …
In-situ monitoring of stress evolution in high power impulse magnetron sputtering-deposited Ti-Al-N films: Effect of substrate bias and temperature
The origin of residual stress during film deposition is a topic of strong interest in the coating
engineering community; it requires appropriate investigation tools to explain the different …
engineering community; it requires appropriate investigation tools to explain the different …
[HTML][HTML] Role of magnetic field and bias configuration on hipims deposition of w films
In this work, the deposition of tungsten (W) films by High Power Impulse Magnetron
Sputtering (HiPIMS) has been investigated. By adopting a combined modeling and …
Sputtering (HiPIMS) has been investigated. By adopting a combined modeling and …
Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films
R Graillot-Vuillecot, AL Thomann, T Lecas… - Vacuum, 2020 - Elsevier
Titanium-based thin films are synthesized by the magnetron sputtering of a titanium target in
pure argon or in a mixture of argon and oxygen (reactive regime) in three experimental …
pure argon or in a mixture of argon and oxygen (reactive regime) in three experimental …
Effect of processing conditions on residual stress in sputtered transition metal nitrides (TiN, ZrN and TaN): Experiments and modeling
Stress evolution during reactive DC magnetron sputtering deposition in TiN, ZrN and TaN
films at different growth rates, pressures and relative gas flow rates was measured by a …
films at different growth rates, pressures and relative gas flow rates was measured by a …
Mechanisms of stress generation in thin films and coatings
AR Shugurov, AV Panin - Technical Physics, 2020 - Springer
Abstract Analysis of the literature data on the reasons for the development of mechanical
stresses in epitaxial, polycrystalline, and amorphous films during their formation and under …
stresses in epitaxial, polycrystalline, and amorphous films during their formation and under …