Nanoimprint lithography (NIL) is a useful technique for the fabrication of nano/micro-
structured materials. This article reviews NIL in the field of demolding processes and is …

To realize the damage-free, highly efficient, and atomic-level polishing of single-crystal Si,
plasma-based atom-selective etching (PASE) is proposed in this study as a generic …

This paper proposes a method for the rapid detection of subsurface damage (SSD) of SiC
using atmospheric inductivity coupled plasma. As a plasma etching method operated at …

Single-crystal silicon carbide (4H-SiC) is a promising third-generation semiconductor
material because of its excellent electrical, mechanical and chemical properties. However …

The demands for precision machining of silicon-based materials are growing in various
modern applications, including micro-electro-mechanical systems (MEMS), micromotors …

In this study, we report an ultra-precision nonsubtractive surface polishing technique named
plasma-induced atom migration manufacturing (PAMM). In PAMM, the molten layer of the …

The precise patterning of front-side mesas, backside vias, and selective removal of ternary
alloys are all needed for power device fabrication in the various wide bandgap (AlGaN/GaN …

In this study, an innovative fabrication method called rolling-slitting forming, which forms
ultra-thin diamond blades, was presented for the first time. Furthermore, the feasibility of the …

SiC/SiC composites have a promising application prospect in the fields of aero-engine
turbine blades and other hot-end components due to their excellent properties. It is difficult to …

Micropipe, a “killer” defect in SiC crystals, severely hampers the outstanding performance of
SiC-based devices. In this paper, the etching behavior of micropipes in 4H-SiC and 6H-SiC …