[图书][B] Fundamentals of nanoscaled field effect transistors

A Chaudhry - 2013 - Springer
This book is an outcome of my research publications during my teaching and research
career. The book is about basic understanding of the MOSFET devices and their physics at …

[PDF][PDF] Design Process, Simulation, And Analysis Of A Common Source MOS Amplifier Circuit In Cadence At 45 Nm CMOS Technology Node

NN Karima, MH Bhuyan - Iosr Journal Of Vlsi And Signal …, 2023 - researchgate.net
This work describes a design process, simulation, and analysis of a CMOS-based common
source amplifier circuit in the Cadence Virtuoso environment at the 45 nm technology node …

[PDF][PDF] Mobility models for unstrained and strained silicon MOSFETs: a review

A Chaudhry, S Sangwan, JN Roy - Contemp. Eng. Sci, 2011 - m-hikari.com
In this paper, a critical review of various models for the effective mobility of charge carriers in
metal oxide semiconductor field effect transistor (MOSFET) inversion layer (p and n type) …

[PDF][PDF] Design Steps, Simulation, and Analysis of a 1-bit ALU in Cadence at 90 nm CMOS Node

KI Shohail, W Awsaf, SU Sayel, MK Nitu, MH Bhuyan - 2023 - researchgate.net
This paper presents the design and analysis of a 1-bit Arithmetic Logic Unit (ALU) with and
without a full adder circuit. The objective of the study is to compare the outputs of the two …

[PDF][PDF] Analytical Subthreshold Drain Current Model Incorporating Inversion Layer Effective Mobility Model for Pocket Implanted Nano Scale n-MOSFET

MH Bhuyan, QDM Khosru - International Journal of Electrical and …, 2014 - academia.edu
Carrier scatterings in the inversion channel of MOSFET dominates the carrier mobility and
hence drain current. This paper presents an analytical model of the subthreshold drain …

[PDF][PDF] Impact of gate insulation material and thickness on pocket implanted MOS device

MH Bhuyan - … Journal of Electronics and Communication Engineering, 2021 - wseas.com
This paper reports on the impact study with the variation of the gate insulation material and
thickness on different models of pocket implanted sub-100 nm n-MOS device. The gate …

[PDF][PDF] Doping Profile Measurement and Characterization by Scanning Capacitance Microscope for Pocket Implanted Nano Scale n-MOSFET

MH Bhuyan, FM Mohammedy, QDM Khosru - Int. J. Electr. Electron. Eng, 2011 - Citeseer
This paper presents the doping profile measurement and characterization technique for the
pocket implanted nano scale n-MOSFET. Scanning capacitance microscopy and atomic …

Temperature effects on subthreshold current of pocket implanted nano scale n-MOSFET

MH Bhuyan, F Ferdous… - 2012 7th International …, 2012 - ieeexplore.ieee.org
Temperature fluctuations affect threshold voltage, carrier mobility and transit time of an n-
MOSFET. This phenomenon induces the variations of drain current in the device. This paper …

[PDF][PDF] Analysis of Subthreshold Drain Current for Pocket Implanted MOSFETs

S Goel, P Mani - researchgate.net
MOSFET with overwhelmingly doped regions toward one side or both completions of the
immediate show subjective differences in electrical direct appeared differently in relation to …

Investigation of carrier mobility degradation effects on MOSFET leakage simulations

B Twala, H Djonon Tsague - 2016 - researchspace.csir.co.za
The term carrier mobility generally alludes to both electron and hole mobility in
semiconductors. These parameters characterize how quickly an electron and/or hole moves …