Models of clustered photolithography tools for fab-level simulation: From affine to flow line
Fab-level discrete-event simulation is an important practical tool for the analysis and
optimization of semiconductor wafer fabricators. In such facilities, a clustered …
optimization of semiconductor wafer fabricators. In such facilities, a clustered …
Exit recursion models of clustered photolithography tools for fab level simulation
In semiconductor wafer fabricators (fabs), clustered photolithography tools (CPTs) are often
the bottleneck. With a focus on fab-level simulation, we propose a new class of equipment …
the bottleneck. With a focus on fab-level simulation, we propose a new class of equipment …
Shortening of cycle time in semiconductor manufacturing via meaningful lot sizes
D Eberts, S Keil, F Peipp… - 2015 26th Annual SEMI …, 2015 - ieeexplore.ieee.org
Cycle time requirements from prime or major customers contradict the ever-increasing
complexity of wafer fabrication. Lot size variations show up as significant cycle time …
complexity of wafer fabrication. Lot size variations show up as significant cycle time …
Cluster tool design comparisons via simulation
K Park, JR Morrison - Proceedings of the 2011 Winter …, 2011 - ieeexplore.ieee.org
The anticipated transition to 450 mm diameter wafers provides the semiconductor
manufacturing industry an opportunity to consider new equipment designs that address …
manufacturing industry an opportunity to consider new equipment designs that address …
On the fidelity of the Ax+ B equipment model for clustered photolithography scanners in fab-level simulation
JR Morrison - Proceedings of the 2011 Winter Simulation …, 2011 - ieeexplore.ieee.org
Linear and affine (Ax+ B) models are commonly used to model equipment throughput in
semiconductor wafer fabricator simulations. We endeavor to assess the quality of such …
semiconductor wafer fabricator simulations. We endeavor to assess the quality of such …
Performance bounds for hybrid flow lines: Fundamental behavior, practical features and application to linear cluster tools
K Park, JR Morrison - 2012 IEEE International Conference on …, 2012 - ieeexplore.ieee.org
For deterministic hybrid flow lines with multiple classes of customer and no overtaking, we
develop upper bounds on the customer departure times. For this general class of systems …
develop upper bounds on the customer departure times. For this general class of systems …
Comparative analyses of control charts in studying tool efficiency in semiconductor fabrication
A Wribhu - 2021 32nd Annual SEMI Advanced Semiconductor …, 2021 - ieeexplore.ieee.org
Due to the complexities of various modules and the cost of machinery involved in
semiconductor fabrication, it is vital to capture the efficiency of parts fabricated during the …
semiconductor fabrication, it is vital to capture the efficiency of parts fabricated during the …
[引用][C] James R. Morrison KAIST, Department of Industrial and Systems Engineering 291 Daehak-ro (373-1 Guseong-dong), Yuseong-gu Daejeon 305-701, Republic …
S Jain, RR Creasey, J Himmelspach, KP White, M Fu