High-k dielectrics for 4H-silicon carbide: present status and future perspectives

A Siddiqui, RY Khosa, M Usman - Journal of Materials Chemistry C, 2021 - pubs.rsc.org
Owing to its superior material and electrical properties such as wide bandgap and high
breakdown electric field, 4H-silicon carbide (4H-SiC) has shown promise in high power …

Structural and insulating behaviour of high-permittivity binary oxide thin films for silicon carbide and gallium nitride electronic devices

R Lo Nigro, P Fiorenza, G Greco, E Schilirò… - Materials, 2022 - mdpi.com
High-κ dielectrics are insulating materials with higher permittivity than silicon dioxide. These
materials have already found application in microelectronics, mainly as gate insulators or …

Mobility improvement of 4H-SiC (0001) MOSFETs by a three-step process of H2 etching, SiO2 deposition, and interface nitridation

K Tachiki, M Kaneko, T Kimoto - Applied Physics Express, 2021 - iopscience.iop.org
Abstract 4H-SiC (0001) metal-oxide-semiconductor field-effect transistors (MOSFETs) and
MOS capacitors were fabricated by the following procedures: H 2 etching, SiO 2 deposition …

[HTML][HTML] Low-pressure oxidation for improving interface properties and voltage instability of SiO2/4H-SiC MOS capacitor

Z Wang, Z Lin, J Li, W Liu - Applied Surface Science, 2025 - Elsevier
The impact of high-temperature sub-atmospheric oxidation pressure on the interface
properties of n-type 4H-SiC metal–oxide–semiconductor capacitors has been systematically …

A Critical review on reliability and short circuit robustness of silicon carbide power MOSFETs

S Sreejith, J Ajayan, SB Devasenapati, B Sivasankari… - Silicon, 2023 - Springer
Superior electrical and physical properties of SiC (Silicon Carbide) make them ideal for
various high voltage, high frequency and high power electronic applications. When …

Leakage Current Behavior in HfO2/SiO2/Al2O3 Stacked Dielectric on 4H-SiC Substrate

H Huang, Y Wang, KH Chen… - IEEE Journal of the …, 2023 - ieeexplore.ieee.org
In this study, we investigate the deposition of high-k dielectric materials, namely Al2O3 and
HfO2, using atomic layer deposition for 4H-SiC metal-oxide-semiconductor applications. CV …

Design and Analysis of High Mobility Enhancement-Mode 4H-SiC MOSFETs Using a Thin-SiO2/Al2O3 Gate-Stack

J Urresti, F Arith, S Olsen, N Wright… - IEEE Transactions on …, 2019 - ieeexplore.ieee.org
High-performance 4H-SiC MOSFETs have been fabricated, having a peak effective mobility
of 265 cm 2/s, and a peak field effect mobility of 154 cm 2/V s, in 2-m gate length MOSFETs …

Adhesion and electronic properties of 4H-SiC/α-Al2O3 interfaces with different terminations calculated via first-principles methods

L Li, S He, H Ruan, S He, D Guo - Surfaces and Interfaces, 2023 - Elsevier
To comprehensively reveal the microscopic properties of the 4H-SiC/α-Al 2 O 3 interface, not
only the properties of 4H-SiC and α-Al 2 O 3 surfaces, but also the interface separation work …

Incorporation of green solvent for low thermal budget flower-like Copper (I) Iodide (γ-CuI) for high-efficiency solar cell

OV Aliyaselvam, F Arith, AN Mustafa… - Journal of Materials …, 2023 - Springer
High conductivity, density, and uniform Copper (I) Iodide (CuI) as Hole Transporting Layer
(HTL) was prepared directly on an Indium-doped Tin Oxide (ITO) substrate. A new green …

[HTML][HTML] High Ion/Ioff ratio 4H-SiC MISFETs with stable operation at 500° C using SiO2/SiNx/Al2O3 gate stacks

J Kang, K Xu, H Lee, S Bhattacharya, Z Zhao… - Applied Physics …, 2023 - pubs.aip.org
In this work, 4H-SiC lateral metal-insulator-semiconductor field-effect transistors (MISFETs)
were demonstrated to operate up to 500 C with a high on/off current ratio (over 10 9). A low …