Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter

H Hu, M Gopinadhan, CO Osuji - Soft matter, 2014 - pubs.rsc.org
Self-assembly of soft materials is broadly considered an attractive means of generating
nanoscale structures and patterns over large areas. However, the spontaneous formation of …

[HTML][HTML] Self-assembly of block copolymer thin films

JNL Albert, TH Epps III - Materials Today, 2010 - Elsevier
Block copolymers self-assemble on nanometer length scales, making them ideal for
emerging nanotechnologies. Many applications (eg, templating, membranes) require the …

Non-fullerene acceptor doped block copolymer for efficient and stable organic solar cells

Y Wu, Q Fan, B Fan, F Qi, Z Wu, FR Lin, Y Li… - ACS Energy …, 2022 - ACS Publications
Bulk-heterojunction organic solar cells (OSCs) often suffer from morphological instability due
to thermo-or photoinduced molecular diffusion. To circumvent such instability, OSCs …

Block copolymer nanolithography: translation of molecular level control to nanoscale patterns

J Bang, U Jeong, DY Ryu, TP Russell… - Advanced …, 2009 - Wiley Online Library
Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
Page 1 Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale …

Ordering in thin films of block copolymers: Fundamentals to potential applications

IW Hamley - Progress in polymer science, 2009 - Elsevier
The ordering of block copolymers in thin films is reviewed, starting from the fundamental
principles and extending to recent promising developments as templates for …

Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication

S Ji, L Wan, CC Liu, PF Nealey - Progress in Polymer Science, 2016 - Elsevier
Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined
chemically nanopatterned surfaces (or chemical patterns) combines advantages of …

Effect of composition of substrate-modifying random copolymers on the orientation of symmetric and asymmetric diblock copolymer domains

E Han, KO Stuen, YH La, PF Nealey… - Macromolecules, 2008 - ACS Publications
The ability of random copolymer brushes and cross-linked mats to induce the vertical
orientation of domains in overlying films of lamellae-and cylinder-forming block copolymers …

Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist

JY Cheng, DP Sanders, HD Truong, S Harrer, A Friz… - ACS …, 2010 - ACS Publications
We report novel strategies to integrate block copolymer self-assembly with 193 nm water
immersion lithography. These strategies employ commercially available positive tone …

Directed self-assembly of block copolymers in the extreme: guiding microdomains from the small to the large

K Koo, H Ahn, SW Kim, DY Ryu, TP Russell - Soft Matter, 2013 - pubs.rsc.org
The self-assembly of block copolymers (BCPs) is emerging as a promising route for
numerous applications to generate templates and scaffolds for the fabrication of …

Perpendicular orientation of domains in cylinder-forming block copolymer thick films by controlled interfacial interactions

E Han, KO Stuen, M Leolukman, CC Liu… - …, 2009 - ACS Publications
We report the induction of perpendicularly oriented cylindrical domains in PS-b-PMMA block
copolymer (BCP) films thicker than 100 nm by thermally annealing on a substrate modified …