Review of solution growth techniques for 4H-SiC single crystal
G Liang, H Qian, Y Su, L Shi, Q Li, Y Liu - China Foundry, 2023 - Springer
Silicon carbide (SiC), a group IV compound and wide-bandgap semiconductor for high-
power, high-frequency and high-temperature devices, demonstrates excellent inherent …
power, high-frequency and high-temperature devices, demonstrates excellent inherent …
Charge-transfer interatomic potential to reproduce 30° partial dislocation movements for 4H-SiC in the surface vicinity and its application to BPD-TED conversion
Abstract 4H-SiC has recently attracted attention as a new power semiconductor material to
replace silicon. One of the challenges impeding its practical use is the elimination of killer …
replace silicon. One of the challenges impeding its practical use is the elimination of killer …
In-situ and ex-situ characterizations of PVT-grown 4H-SiC single crystals
Q Shao, R Shen, H Tian, X Pi, D Yang… - Journal of Physics D …, 2024 - iopscience.iop.org
Abstract 4H silicon carbide (4H-SiC) is one of the most promising candidates in high-power
and high-frequency devices, owing to its excellent properties such as wide bandgap, high …
and high-frequency devices, owing to its excellent properties such as wide bandgap, high …
Origin and generation process of a triangular single Shockley stacking fault expanding from the surface side in 4H-SiC PIN diodes
C Ota, J Nishio, A Okada, R Iijima - Journal of Electronic Materials, 2021 - Springer
A triangular single Shockley stacking fault (1SSF) in 4H-SiC, expanding from the surface to
the substrate/epilayer interface, was investigated. The triangular 1SSF was observed during …
the substrate/epilayer interface, was investigated. The triangular 1SSF was observed during …
Informative Aspects of Molten KOH Etch Pits Formed at Basal Plane Dislocations on the Surface of 4H‐SiC
J Nishio, C Ota, A Okada, R Iijima - physica status solidi (a), 2020 - Wiley Online Library
Despite being a destructive technique, molten KOH etch pits at basal plane dislocations are
found to have informative aspects, as revealed by photoluminescence imaging and optical …
found to have informative aspects, as revealed by photoluminescence imaging and optical …
Long-range Tersoff potential for silicon to reproduce 30° partial dislocation migration
Dislocation in silicon has been studied from atomistic viewpoints for many years. It is widely
acknowledged that the bond-order Tersoff potential does not reproduce the dislocation …
acknowledged that the bond-order Tersoff potential does not reproduce the dislocation …
Effects of terraces and steps on the 4H-SiC BPD-TED conversion rate: A reaction pathway analysis
The practical use of 4H-SiC as a semiconductor material alternative to Si has been
investigated by several researchers. However, a key challenge impeding its practical …
investigated by several researchers. However, a key challenge impeding its practical …
Effects of constant voltage stress on bipolar degradation in 4H-SiC IGBT
Y An, W Zhang, X Tang, X Niu, L Wang, X Yang… - Journal of Crystal …, 2023 - Elsevier
The analysis of bipolar degradation in 18 kV SiC IGBT with constant voltage stress was
studied. Its fabrication process as well as testing conditions of IGBT device structure were …
studied. Its fabrication process as well as testing conditions of IGBT device structure were …
Reaction pathway analysis for the contraction of 4H-SiC partial-dislocations pair in the vicinity of surface
A Hirano, H Sakakima, A Hatano… - Japanese Journal of …, 2021 - iopscience.iop.org
In order to reduce harmful dislocations in the 4H-SiC substrate, the improvement technique
of basal plane dislocation-threading edge dislocation (BPD-TED) conversion ratio has been …
of basal plane dislocation-threading edge dislocation (BPD-TED) conversion ratio has been …
Defect appearance on 4H-SiC homoepitaxial layers via molten KOH etching
XF Liu, GG Yan, L Sang, YX Niu, YW He… - Journal of Crystal …, 2020 - Elsevier
Epitaxial defects such as threading screw dislocation (TSD), basal plane dislocation (BPD)
and so on will seriously reduce the reverse voltage or increase leakage current of power …
and so on will seriously reduce the reverse voltage or increase leakage current of power …