Transport phenomena in nano/molecular confinements
The transport of fluid and ions in nano/molecular confinements is the governing physics of a
myriad of embodiments in nature and technology including human physiology, plants …
myriad of embodiments in nature and technology including human physiology, plants …
Review in manufacturing methods of nanochannels of bio-nanofluidic chips
X Chen, L Zhang - Sensors and Actuators B: Chemical, 2018 - Elsevier
This review reports the progress on the recent development of manufacturing methods of
nanochannels of bio-nanofluidic chips. Various manufacturing methods including reactive …
nanochannels of bio-nanofluidic chips. Various manufacturing methods including reactive …
Ultraviolet nanoimprint lithography using cyclodextrin-based porous template for pattern failure reduction
S Takei, M Hanabata - Applied Physics Letters, 2015 - pubs.aip.org
An approach to ultraviolet (UV) nanoimprint lithography using a cyclodextrin-based porous
template was investigated for the reduction of air trapping and template damage caused by …
template was investigated for the reduction of air trapping and template damage caused by …
Reduction of pattern peeling in step-and-flash imprint lithography
S Takei, T Ogawa, R Deschner, CG Willson - Microelectronic engineering, 2014 - Elsevier
A strong adhesion force between resist and underlayer materials was employed to reduce
resist pattern peeling generated from de-molding in step-and-flash imprint lithography …
resist pattern peeling generated from de-molding in step-and-flash imprint lithography …
Silicon-containing spin-on underlayer material for step and flash nanoimprint lithography
S Takei, T Ogawa, R Deschner, K Jen… - Japanese Journal of …, 2010 - iopscience.iop.org
Nanoimprint lithography is a newly developed patterning method that employs a hard
template for the patterning of structures at micro-and nanometer scales. This technique has …
template for the patterning of structures at micro-and nanometer scales. This technique has …
Gas‐Permeable Cellulose Template for Reduction of Template Damage and Gas Trapping in Microimprint Lithography of High Volume Manufacturing
S Takei, S Nakajima, K Sugahara… - Macromolecular …, 2016 - Wiley Online Library
A gas‐permeable cellulose template for microimprint lithography has been synthesized and
characterized for the reduction of template damage and gas trapping caused by solvents …
characterized for the reduction of template damage and gas trapping caused by solvents …
Fabrication of nanosized antireflection patterns on surface of aspheric lens substrate by nanoimprint lithography
JH Shin, HJ Choi, GT Kim, JH Choi… - Applied Physics …, 2013 - iopscience.iop.org
Currently, various techniques are being explored for fabricating nano-or microsized patterns
on flat and curved substrates. However, there are only a few techniques that can be used to …
on flat and curved substrates. However, there are only a few techniques that can be used to …
Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography
S Takei, M Hanabata - Applied Physics Express, 2016 - iopscience.iop.org
This study aimed to expand the resolution limits of epoxy novolac resins that have enhanced
etch resistance as one of the desirable resist properties for next-generation devices. Epoxy …
etch resistance as one of the desirable resist properties for next-generation devices. Epoxy …
A novel method to fabricate micro-gratings applied for deformation measurement around a crack in a thin film
D Wu, H Xie, X Dai, R Wang - Measurement Science and …, 2014 - iopscience.iop.org
The grating fabrication technique has been of great concern in the use of the grating based
deformation measurement method. Although various methods have been developed to …
deformation measurement method. Although various methods have been developed to …
Study of fluorinated silicon-based resist material and photoreactive underlayer for defect reduction in step and repeat ultraviolet nanoimprint lithography
S Takei, T Ogawa, CG Willson - Micro & Nano Letters, 2011 - IET
Step and repeat ultraviolet (UV) nanoimprint lithography has advantages such as metal-
direct patterning, develop-less process, low line-edge-roughness and easy operation …
direct patterning, develop-less process, low line-edge-roughness and easy operation …