Bottom-up nanofabrication by area-selective atomic layer deposition (ALD) is currently
gaining momentum in semiconductor processing, because of the increasing need for …

Atomic layer deposition (ALD) is a method that allows for the deposition of thin films with
atomic level control of the thickness and an excellent conformality on 3-dimensional …

Due to the unique set of properties possessed by ZnO, thin films of ZnO have received more
and more interest in the last 20 years as a potential material for applications such as thin-film …

Halide perovskite light-emitting diodes (PeLEDs) exhibit great potential for use in next-
generation display technologies. However, scale-up will be challenging due to the …

In the past decades, Moore's law drives the semiconductor industry to continuously shrink
the critical size of transistors down to 7 nm. As transistors further downscaling to smaller …

Electrode materials play a decisive role in almost all electrochemical energy storage
devices, determining their overall performance. Proper selection, design and fabrication of …

Poly (methyl methacrylate)(PMMA) is a thermoplastic synthetic polymer, which displays
superior characteristics such as transparency, good tensile strength, and processability. Its …

In this paper, we present the progress in the growth of nanoscale semiconductors grown via
atomic layer deposition (ALD). After the adoption by semiconductor chip industry, ALD …

Functional materials including metals, ceramics, plastics, and nanomaterials are now widely
adopted in modern devices. To facilitate the fabrication of nanostructured functional …

Area-selective atomic layer deposition (AS-ALD) has attracted immense attention in recent
years for self-aligned accurate pattern placement with subnanometer thickness control …