In the past decade, the feature size in ultra large-scale integration (ULSI) has been
continuously decreasing, leading to nanostructure fabrication. Nowadays, various …

The nanotechnology revolution of the past decade owes much to the science of lithography,
an umbrella term which encompasses everything from conventional photolithography to …

Further progress in the spatial resolution of X-ray microscopes is currently impaired by
fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate …

Cost effective patterning based on scanning probe nanolithography (SPL) has the potential
for electronic and optical nano-device manufacturing and other nanotechnological …

Extreme ultra violet (EUV) lithography is one of the most promising next generation
lithographic techniques for the production of sub-50 nm feature sizes with applications in the …

We have printed dense line/space patterns with half-pitches as small as 12.5 nm in a
negative-tone calixarene resist using extreme ultraviolet (EUV) interference lithography. The …

Advancements in photopolymers have led to groundbreaking achievements in the
electronics, print, optical engineering, and medical fields. At present, photopolymers have …

We investigated novel patterning techniques to produce ultrafine patterns for nanoscale
devices. Hydrogen silsesquioxane (HSQ) was employed as a high-resolution negative tone …

抄録 We have investigated the possibility of amorphous low molecular weight polyphenols
as a chemically amplified positive-tone electron-beam (EB) resist. Two low molecular weight …

The synthesis and properties of noria derivatives (noria-ADs) with pendant adamantate (AD)
groups were examined to assess the suitability of these compounds for application as …