Techniques for increasing Weff VFET devices are provided. In one aspect, a method of
forming a fin structure includes: depositing a hardmask onto a substrate; depositing a …

Lithographic wavelength of 193 nm has been used for past few generations of patterning
and is likely to remain in use for next few technology generations (at least till 28 nm …

Glomerulus extraction is an important step for automatic analysis of the kidney diseases in
the computer-aided diagnosis system. A method based on searching the best fitting curve is …

For many years, a key aspect of Design-for-Manufacturability (DFM) has been adjustment of
polygons in standard cell layout. Similarly, radically restricted design rules and …

In this paper, we investigate electrical effects of transistor layout shape (both in the channel
and diffusion) on the performance and leakage current. Through layout optimization …

With the process scaling, the leakage current reduction has been the primary design
concerns in a nanometer-era VLSI circuit. In this paper, we propose a new lithography …

Due to the increasing need for low-power circuits in mobile applications, numerous leakage
and performance optimization techniques are being used in modern ICs. In the present …

As semiconductor manufacturing processing scaling down, leakage current of CMOS circuits
is becoming a dominant contributor to power dissipation. This paper provides an efficient …

Este trabalho trata do estudo do efeito do desalinhamento da máscara de porta sobre as
características elétricas dos MOSFETs (Metal Oxide Semiconductor Field Effect Transistor) …

With the process scaling, the leakage current reduction has been the primary design
concerns in a nanometer-era VLSI circuit. In this paper, we propose a new lithography …