Spokes in high power impulse magnetron sputtering plasmas

A Hecimovic, A Von Keudell - Journal of Physics D: Applied …, 2018 - iopscience.iop.org
High-power impulse magnetron sputtering is a deposition technique where a metal
magnetron target is sputtered in a high-density plasma to synthesise thin layers with …

Foundations of physical vapor deposition with plasma assistance

JT Gudmundsson, A Anders… - … Sources Science and …, 2022 - iopscience.iop.org
Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by
physical means, followed by deposition of those atoms on a nearby surface to form a thin …

Nanosynthesis by atmospheric arc discharges excited with pulsed-DC power: a review

C Corbella, S Portal, MN Kundrapu, M Keidar - Nanotechnology, 2022 - iopscience.iop.org
Plasma technology is actively used for nanoparticle synthesis and modification. All plasma
techniques share the ambition of providing high quality, nanostructured materials with full …

PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads

M Gebhard, L Mai, L Banko, F Mitschker… - … applied materials & …, 2018 - ACS Publications
A study on the plasma-enhanced atomic layer deposition of amorphous inorganic oxides
SiO2 and Al2O3 on polypropylene (PP) was carried out with respect to growth taking place …

On manufacturing multilayer-like nanostructures using misorientation gradients in PVD films

PRT Avila, EP da Silva, AM Rodrigues, K Aristizabal… - Scientific Reports, 2019 - nature.com
Due to their applicability for manufacturing dense, hard and stable coatings, Physical Vapor
Deposition (PVD) techniques, such as High Power Impulse Magnetron Sputtering (HiPIMS) …

Pulsed anodic arc discharge for the synthesis of carbon nanomaterials

C Corbella, S Portal, DB Zolotukhin… - Plasma Sources …, 2019 - iopscience.iop.org
Pulsed arc discharges can improve arc control and tailor the ablation process in the
production of 1D and 2D nanostructures from carbon anodes. In this work, low-dimensional …

Pattern formation in high power impulse magnetron sputtering (HiPIMS) plasmas

J Held, A von Keudell - Plasma Chemistry and Plasma Processing, 2020 - Springer
High power impulse magnetron sputtering (HiPIMS) plasmas produce a very energetic
growth flux for the synthesis of thin films with superior properties. High power densities in the …

Wide range investigation of duty cycle and frequency effects on bipolar magnetron sputtering of chromium nitride

E Haye, JL Colaux, P Moskovkin, JJ Pireaux… - Surface and Coatings …, 2018 - Elsevier
Among the different techniques of reactive sputtering, the bipolar and high power impulse
magnetron sputtering are growing in interest for the thin films research community. However …

Understanding the deformation and cracking behavior of Cr-based coatings deposited by hybrid direct current and high power pulse magnetron sputtering: From …

T Brögelmann, K Bobzin, NC Kruppe, M Arghavani - Thin Solid Films, 2019 - Elsevier
The increasing demand for corrosion and wear reduction in modern tribological systems
places high requirements on hard coatings deposited by physical vapor deposition (PVD) …

Electrochemical Properties of CrAl/CrAlN and CrAl/CrAlN-(a-CNx) Multilayer Deposited by High Power Impulse Magnetron Sputtering

CJ Martínez-González, M Flores-Jimenez… - Journal of Materials …, 2023 - Springer
The corrosion resistance of two multilayered metallic/ceramic coatings deposited from a 50:
50 vol.% CrAl target, with a-CN x top layer deposited by High Power Impulse Magnetron …