Nonthermal plasma synthesis of semiconductor nanocrystals

U Kortshagen - Journal of Physics D: Applied Physics, 2009 - iopscience.iop.org
Semiconductor nanocrystals have attracted considerable interest for a wide range of
applications including light-emitting devices and displays, photovoltaic cells, nanoelectronic …

Plasma enhanced chemical vapor deposition of silicon thin films for large area electronics

PR i Cabarrocas - Current Opinion in Solid State and Materials Science, 2002 - Elsevier
In the past 2 years major advances have been made in the understanding of silane–
hydrogen plasmas. In particular, the control of the formation of clusters and even crystallites …

Structure and hydrogen content of polymorphous silicon thin films studied by spectroscopic ellipsometry and nuclear measurements

AF i Morral, PR i Cabarrocas, C Clerc - Physical Review B, 2004 - APS
The dielectric functions of amorphous and polymorphous silicon films prepared under
various plasma conditions have been deduced from UV-visible spectroscopic ellipsometry …

Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films

PR i Cabarrocas - Journal of non-crystalline solids, 2000 - Elsevier
The plasma processes and growth reactions involved in the deposition of amorphous,
polymorphous and microcrystalline silicon thin films are reviewed. The reference being a-Si …

Modelling of silicon hydride clustering in a low-pressure silane plasma

UV Bhandarkar, MT Swihart, SL Girshick… - Journal of Physics D …, 2000 - iopscience.iop.org
A new silicon hydride clustering model was developed to study the nucleation of particles in
a low-temperature silane plasma. The model contains neutral silanes, silylenes, silenes and …

Numerical investigation of particle formation mechanisms in silane discharges

K De Bleecker, A Bogaerts, R Gijbels… - Physical Review E …, 2004 - APS
The formation of particles in low-pressure silane discharges has been studied extensively
over the last decade. In this paper we try to identify, by numerical simulations, the precursors …

Atomic structure of the nanocrystalline Si particles appearing in nanostructured Si thin films produced in low-temperature radiofrequency plasmas

G Viera, M Mikikian, E Bertran… - Journal of Applied …, 2002 - pubs.aip.org
Nanostructured Si thin films, also referred as polymorphous, were grown by plasma-
enhanced chemical vapor deposition. The term “polymorphous” is used to define silicon …

Size dependent characteristics of plasma synthesized carbonaceous nanoparticles

E Kovacevic, J Berndt, T Strunskus… - Journal of Applied …, 2012 - pubs.aip.org
Low temperature plasmas with their strong non equilibrium character offer unique
possibilities for the production of nanoparticles. This contribution deals with size dependent …

Growth and optoelectronic properties of polymorphous silicon thin films

PR i Cabarrocas, AF i Morral, Y Poissant - Thin Solid Films, 2002 - Elsevier
Polymorphous silicon is a nanostructured thin film consisting of a small fraction of
nanocrystalline silicon particles and/or clusters embedded in a relaxed amorphous matrix …

Nanocrystalline silicon films prepared from silane plasma in RF-PECVD, using helium dilution without hydrogen: structural and optical characterization

K Bhattacharya, D Das - Nanotechnology, 2007 - iopscience.iop.org
The effect of RF power on the nanocrystallization of a Si: H network has been studied by
PECVD at a substrate temperature of 200 C and a gas pressure of 0.5 Torr, using silane as …