Self-assembly approaches, eg colloidal, emulsion and polymer phase separation, provide
scientists with an exotic yet direct platform to access technologically desired nanostructures …

Self-assembly of soft materials is broadly considered an attractive means of generating
nanoscale structures and patterns over large areas. However, the spontaneous formation of …

This Perspective provides a critical analysis of the current knowledge concerning solvent
vapor annealing (SVA) of block polymer thin films. Herein, we identify key challenges that …

Block copolymer (BCP) represents a special type of polymeric system where each of the
polymer chains is composed of two or more chemically distinct homopolymer blocks that are …

Dense periodic arrays of holes and dots have been fabricated in a silicon nitride–coated
silicon wafer. The holes are 20 nanometers across, 40 nanometers apart, and hexagonally …

Block copolymers (BCPs) have received great attention for the past 40 years but only within
the past decade have they been seriously considered for nanotechnological applications …

▪ Abstract A two-part review of research concerning block copolymer thin films is presented.
The first section summarizes experimental and theoretical studies of the fundamental …

The long‐range order of spherical block copolymer films is greatly improved if the underlying
surface has been etched to form wells and mesas. Epitaxial growth of polystyrene/poly (2 …

US6565763B1 - Method for manufacturing porous structure and method for forming pattern -
Google Patents US6565763B1 - Method for manufacturing porous structure and method for …

Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined
chemically nanopatterned surfaces (or chemical patterns) combines advantages of …