Stochastic charge trapping in oxides: From random telegraph noise to bias temperature instabilities

T Grasser - Microelectronics Reliability, 2012 - Elsevier
Charge trapping at oxide defects fundamentally affects the reliability of MOS transistors. In
particular, charge trapping has long been made responsible for random telegraph and 1/f …

Controversial issues in negative bias temperature instability

JH Stathis, S Mahapatra, T Grasser - Microelectronics Reliability, 2018 - Elsevier
In spite of 50 years of history, there is still no consensus on the basic physics of Negative
Bias Temperature Instability. Two competing models, Reaction-Diffusion and Defect-Centric …

Nonlinear fiber optics

GP Agrawal - Nonlinear Science at the Dawn of the 21st Century, 2000 - Springer
Nonlinear fiber optics concerns with the nonlinear optical phenomena occurring inside
optical fibers. Although the field ofnonlinear optics traces its beginning to 1961, when a ruby …

The paradigm shift in understanding the bias temperature instability: From reaction–diffusion to switching oxide traps

T Grasser, B Kaczer, W Goes… - … on Electron Devices, 2011 - ieeexplore.ieee.org
One of the most important degradation modes in CMOS technologies, the bias temperature
instability (BTI) has been known since the 1960s. Already in early interpretations, charge …

A comparative study of different physics-based NBTI models

S Mahapatra, N Goel, S Desai, S Gupta… - IEEE transactions on …, 2013 - ieeexplore.ieee.org
Different physics-based negative bias temperature instability (NBTI) models as proposed in
the literature are reviewed, and the predictive capability of these models is benchmarked …

Ubiquitous relaxation in BTI stressing—New evaluation and insights

B Kaczer, T Grasser, J Roussel… - 2008 IEEE …, 2008 - ieeexplore.ieee.org
The ubiquity of threshold voltage relaxation is demonstrated in samples with both
conventional and high-k dielectrics following various stress conditions. A technique based …

A two-stage model for negative bias temperature instability

T Grasser, B Kaczer, W Goes… - 2009 IEEE …, 2009 - ieeexplore.ieee.org
Based on the established properties of the most commonly observed defect in amorphous
oxides, the E'center, we suggest a coupled two-stage model to explain the negative bias …

BTI analysis tool—Modeling of NBTI DC, AC stress and recovery time kinetics, nitrogen impact, and EOL estimation

N Parihar, N Goel, S Mukhopadhyay… - IEEE Transactions on …, 2017 - ieeexplore.ieee.org
A comprehensive modeling framework is presented to predict the time kinetics of negative
bias temperature instability stress and recovery during and after dc and ac stresses and also …

Density of interface states, electron traps, and hole traps as a function of the nitrogen density in SiO2 on SiC

J Rozen, S Dhar, ME Zvanut, JR Williams… - Journal of Applied …, 2009 - pubs.aip.org
Nitridation of the SiO 2/SiC interface yields a reduction in interface state density, immunity to
electron injection, as well as increased hole trapping. It is shown that the accumulation of …

[图书][B] Nonlinear effects in optical fibers

MFS Ferreira - 2011 - books.google.com
This book will provide insight into the principles and applications of nonlinear effects in
fibers for students, researchers, and developers who have a basic understanding of …