Stochastic charge trapping in oxides: From random telegraph noise to bias temperature instabilities
T Grasser - Microelectronics Reliability, 2012 - Elsevier
Charge trapping at oxide defects fundamentally affects the reliability of MOS transistors. In
particular, charge trapping has long been made responsible for random telegraph and 1/f …
particular, charge trapping has long been made responsible for random telegraph and 1/f …
Controversial issues in negative bias temperature instability
In spite of 50 years of history, there is still no consensus on the basic physics of Negative
Bias Temperature Instability. Two competing models, Reaction-Diffusion and Defect-Centric …
Bias Temperature Instability. Two competing models, Reaction-Diffusion and Defect-Centric …
Nonlinear fiber optics
GP Agrawal - Nonlinear Science at the Dawn of the 21st Century, 2000 - Springer
Nonlinear fiber optics concerns with the nonlinear optical phenomena occurring inside
optical fibers. Although the field ofnonlinear optics traces its beginning to 1961, when a ruby …
optical fibers. Although the field ofnonlinear optics traces its beginning to 1961, when a ruby …
The paradigm shift in understanding the bias temperature instability: From reaction–diffusion to switching oxide traps
One of the most important degradation modes in CMOS technologies, the bias temperature
instability (BTI) has been known since the 1960s. Already in early interpretations, charge …
instability (BTI) has been known since the 1960s. Already in early interpretations, charge …
A comparative study of different physics-based NBTI models
Different physics-based negative bias temperature instability (NBTI) models as proposed in
the literature are reviewed, and the predictive capability of these models is benchmarked …
the literature are reviewed, and the predictive capability of these models is benchmarked …
Ubiquitous relaxation in BTI stressing—New evaluation and insights
The ubiquity of threshold voltage relaxation is demonstrated in samples with both
conventional and high-k dielectrics following various stress conditions. A technique based …
conventional and high-k dielectrics following various stress conditions. A technique based …
A two-stage model for negative bias temperature instability
Based on the established properties of the most commonly observed defect in amorphous
oxides, the E'center, we suggest a coupled two-stage model to explain the negative bias …
oxides, the E'center, we suggest a coupled two-stage model to explain the negative bias …
BTI analysis tool—Modeling of NBTI DC, AC stress and recovery time kinetics, nitrogen impact, and EOL estimation
A comprehensive modeling framework is presented to predict the time kinetics of negative
bias temperature instability stress and recovery during and after dc and ac stresses and also …
bias temperature instability stress and recovery during and after dc and ac stresses and also …
Density of interface states, electron traps, and hole traps as a function of the nitrogen density in SiO2 on SiC
Nitridation of the SiO 2/SiC interface yields a reduction in interface state density, immunity to
electron injection, as well as increased hole trapping. It is shown that the accumulation of …
electron injection, as well as increased hole trapping. It is shown that the accumulation of …
[图书][B] Nonlinear effects in optical fibers
MFS Ferreira - 2011 - books.google.com
This book will provide insight into the principles and applications of nonlinear effects in
fibers for students, researchers, and developers who have a basic understanding of …
fibers for students, researchers, and developers who have a basic understanding of …