High-energy-density pinch plasma: A unique nonconventional tool for plasma nanotechnology
RS Rawat - IEEE Transactions on Plasma Science, 2013 - ieeexplore.ieee.org
Low-temperature (<; 10 eV) plasmas with densities varying over a very wide range from 10
13 m-3 at the lower end to as high as 10 23 m-3 have firmly established themselves as one …
13 m-3 at the lower end to as high as 10 23 m-3 have firmly established themselves as one …
Dense plasma focus-from alternative fusion source to versatile high energy density plasma source for plasma nanotechnology
RS Rawat - Journal of Physics: Conference Series, 2015 - iopscience.iop.org
The dense plasma focus (DPF), a coaxial plasma gun, utilizes pulsed high current electrical
discharge to heat and compress the plasma to very high density and temperature with …
discharge to heat and compress the plasma to very high density and temperature with …
Research with plasma foci in countries of Asia, Africa, and Latin America
AE Dubinov, EI Fomicheva, LA Senilov - Reviews of Modern Plasma …, 2020 - Springer
This paper considers the modern level of technique, research, and application of “plasma
focus” facilities in the countries of Asia, Africa, and Latin America. A description of the …
focus” facilities in the countries of Asia, Africa, and Latin America. A description of the …
Properties of ion beams generated by nitrogen plasma focus
Numerical experiments have been systematically carried out using the modified Lee model
code on various plasma focus devices operated with nitrogen gas. The ion beam properties …
code on various plasma focus devices operated with nitrogen gas. The ion beam properties …
Post-annealing effect on the structural and mechanical properties of multiphase zirconia films deposited by a plasma focus device
Nanostructured multiphase zirconia films (MZFs) are deposited on Zr substrate by the
irradiation of energetic oxygen ions emanated from a plasma focus device. The oxygen …
irradiation of energetic oxygen ions emanated from a plasma focus device. The oxygen …
Role of charge particles irradiation on the deposition of AlN films using plasma focus device
Highly crystalline AlN films are deposited on Si substrate by the bombardment of charge
particles emanating from plasma focus device. Deposition of AlN films are carried out for …
particles emanating from plasma focus device. Deposition of AlN films are carried out for …
Study of Structural and Mechanical Properties of WN/a-Si3N4 Hard Coatings Grown by Plasma Focus
Abstract WN/a-Si 3 N 4 thin films have been synthesized by utilizing the energetic
ion/electron species emanated from hot, dense pinched plasma column in UNU/ICTP …
ion/electron species emanated from hot, dense pinched plasma column in UNU/ICTP …
Role of nitrogen pressure on the structural and mechanical properties of ZrON composite films deposited by plasma focus device
Polycrystalline zirconium oxy-nitride (P-ZrON) composite films are deposited on Zr
substrates by plasma focus device. The focusing efficiency of plasma focus is maximum at …
substrates by plasma focus device. The focusing efficiency of plasma focus is maximum at …
Dense Plasma Focus—High-Energy-Density Pulsed Plasma Device Based Novel Facility for Controlled Material Processing and Synthesis
RS Rawat - Plasma Science and Technology for Emerging …, 2017 - Springer
Researchers and industries are always in continuous search of new facilities or
methodologies that can be used for material synthesis or processing. There are a variety of …
methodologies that can be used for material synthesis or processing. There are a variety of …
[PDF][PDF] Variation of ion energy flux with increasing working gas pressures using Faraday cup in plasma focus device
HAR Tariq, IA Khan, U Ikhlaq, A Hussnain - Journal of Natural Sciences …, 2008 - gcu.edu.pk
Faraday Cup is used to estimate the ion energy flux with various working gas (nitrogen)
pressures (0.75 mbar, 1 mbar and 1.25 mbar) in the chamber of plasma focus device …
pressures (0.75 mbar, 1 mbar and 1.25 mbar) in the chamber of plasma focus device …