Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by
physical means, followed by deposition of those atoms on a nearby surface to form a thin …

The present review provides an overview of the basic theory of sputtering with recent
models, focusing in particular on sputtered atom energy distribution functions. Molecular …

The ionization region model (IRM) is applied to model high power impulse magnetron
sputtering (HiPIMS) discharges with a Cu target. We apply the model to three discharges …

Molecular dynamics simulations are becoming a powerful tool for examining and predicting
atomic and molecular processes in various environments. The present review showcases …

The angular dependence of the deposition rates due to ions and neutrals in high-power
impulse magnetron sputtering (HiPIMS) discharges with a titanium target were determined …

The use of superconducting radio frequency (rf) cavities in particle accelerators necessitates
that copper (Cu) surfaces are coated by thin niobium (Nb) films, predominantly synthesized …

Magnetron sputtering combines a glow discharge with sputtering from a target that
simultaneously serves as a cathode for the discharge. The electrons of the discharge are …

In this study, titanium–zirconium binary alloy films were deposited using heterogeneous dual-
cathode high-power impulse magnetron sputtering with a closed magnetron field. For both Ti …

The sideways (radial) deposition rate and ionized flux fraction in a high power impulse
magnetron sputtering (HiPIMS) discharge are studied and compared to a dc magnetron …