Photoelectrochemical water splitting: a road from stable metal oxides to protected thin film solar cells

C Ros, T Andreu, JR Morante - Journal of Materials Chemistry A, 2020 - pubs.rsc.org
Photoelectrochemical (PEC) water splitting has attracted great attention during past decades
thanks to the possibility to reduce the production costs of hydrogen or other solar fuels, by …

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

V Miikkulainen, M Leskelä, M Ritala… - Journal of Applied …, 2013 - pubs.aip.org
Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis

J Lu, JW Elam, PC Stair - Surface Science Reports, 2016 - Elsevier
Catalyst synthesis with precise control over the structure of catalytic active sites at the atomic
level is of essential importance for the scientific understanding of reaction mechanisms and …

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

RL Puurunen - Journal of applied physics, 2005 - pubs.aip.org
Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential
self-terminating gas–solid reactions, has for about four decades been applied for …

Ultrathin films on copper (I) oxide water splitting photocathodes: a study on performance and stability

A Paracchino, N Mathews, T Hisatomi… - Energy & …, 2012 - pubs.rsc.org
The utilisation of Cu2O photocathodes for photoelectrochemical water splitting requires their
stabilisation due to photocorrosion in aqueous electrolytes. Ultrathin films of wide band gap …

Structural, optical, and electrical properties of TiO2 thin films deposited by ALD: Impact of the substrate, the deposited thickness and the deposition temperature

A Jolivet, C Labbé, C Frilay, O Debieu, P Marie… - Applied Surface …, 2023 - Elsevier
TiO 2 films were deposited by ALD on Si and glass substrates. FTIR analysis reveals an
incomplete process for deposition temperatures below 160° C. The transition from the …

[图书][B] Chemical vapour deposition: precursors, processes and applications

AC Jones, ML Hitchman - 2009 - books.google.com
Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical
precursors in the vapour phase, and encompasses a variety of deposition techniques …

Interfacial Polarization-Induced Loss Mechanisms in Polypropylene/BaTiO3 Nanocomposite Dielectrics

G Zhang, D Brannum, D Dong, L Tang… - Chemistry of …, 2016 - ACS Publications
Polymer/inorganic particle nanocomposites (or nanodielectrics) have attracted pronounced
attention for electric energy storage applications, based on a hypothesis that polymer …

ZnO−Al2O3 and ZnO−TiO2 Core−Shell Nanowire Dye-Sensitized Solar Cells

M Law, LE Greene, A Radenovic… - The Journal of …, 2006 - ACS Publications
We describe the construction and performance of dye-sensitized solar cells (DSCs) based
on arrays of ZnO nanowires coated with thin shells of amorphous Al2O3 or anatase TiO2 by …

Atomic layer deposition of conductive and semiconductive oxides

B Macco, WMM Kessels - Applied Physics Reviews, 2022 - pubs.aip.org
Conductive and semiconductive oxides constitute a class of materials of which the electrical
conductivity and optical transparency can be modulated through material design (eg, doping …