N-polar GaN epitaxy and high electron mobility transistors

MH Wong, S Keller, SD Nidhi… - Semiconductor …, 2013 - iopscience.iop.org
This paper reviews the progress of N-polar ($000\mathop 1\limits^\_ $) GaN high frequency
electronics that aims at addressing the device scaling challenges faced by GaN high …

Polarization-induced hole doping in wide–band-gap uniaxial semiconductor heterostructures

J Simon, V Protasenko, C Lian, H Xing, D Jena - Science, 2010 - science.org
Impurity-based p-type doping in wide–band-gap semiconductors is inefficient at room
temperature for applications such as lasers because the positive-charge carriers (holes) …

[HTML][HTML] Toward AlGaN channel HEMTs on AlN: Polarization-induced 2DEGs in AlN/AlGaN/AlN heterostructures

J Singhal, R Chaudhuri, A Hickman, V Protasenko… - APL Materials, 2022 - pubs.aip.org
Due to its high breakdown electric field, the ultra-wide bandgap semiconductor AlGaN has
garnered much attention recently as a promising channel material for next-generation high …

Polarization induced pn-junction without dopant in graded AlGaN coherently strained on GaN

S Li, M Ware, J Wu, P Minor, Z Wang, Z Wu… - Applied Physics …, 2012 - pubs.aip.org
Polarization induced pn-junction without dopant in graded AlGaN coherently strained on GaN |
Applied Physics Letters | AIP Publishing Skip to Main Content Umbrella Alt Text Umbrella Alt …

Transport properties of polarization-induced 2D electron gases in epitaxial AlScN/GaN heterojunctions

J Casamento, TS Nguyen, Y Cho, C Savant… - Applied Physics …, 2022 - pubs.aip.org
AlScN is attractive as a lattice-matched epitaxial barrier layer for incorporation in GaN high
electron mobility transistors due to its large dielectric constant and polarization. The …

Polarization induced hole doping in graded AlxGa1− xN (x= 0.7∼ 1) layer grown by molecular beam epitaxy

S Li, T Zhang, J Wu, Y Yang, Z Wang, Z Wu… - Applied Physics …, 2013 - pubs.aip.org
Polarization induced hole doping on the order of∼ 10 18 cm− 3 is achieved in linearly
graded Al x Ga 1− x N (x= 0.7∼ 1) layer grown by molecular beam epitaxy. Graded Al x Ga …

Calculated thermoelectric properties of InxGa1− xN, InxAl1− xN, and AlxGa1− xN

A Sztein, J Haberstroh, JE Bowers… - Journal of Applied …, 2013 - pubs.aip.org
The thermoelectric properties of III-nitride materials are of interest due to their potential use
for high temperature power generation applications and the increasing commercial …

Improved p-type conductivity in Al-rich AlGaN using multidimensional Mg-doped superlattices

TC Zheng, W Lin, R Liu, DJ Cai, JC Li, SP Li… - Scientific reports, 2016 - nature.com
A novel multidimensional Mg-doped superlattice (SL) is proposed to enhance vertical hole
conductivity in conventional Mg-doped AlGaN SL which generally suffers from large …

Electron lifetime and diffusion coefficient in dopant-free p-type distributed polarization doped AlGaN

T Kumabe, S Kawasaki, H Watanabe, Y Honda… - Applied Physics …, 2023 - pubs.aip.org
Minority carrier properties in dopant-free p-type distributed polarization doped (DPD) AlGaN
layers were investigated on the basis of the forward-biased current density–voltage (J–V) …

N-polar III-nitride transistors

MH Wong, UK Mishra - Semiconductors and Semimetals, 2019 - Elsevier
This chapter reviews the historical development and present status of N-polar 000 1¯ GaN
high electron mobility transistors (HEMTs) that aim at addressing the device scaling …