Optimization and characterization of direct UV laser writing system for microscale applications
Direct laser writing is a lithography technique for fabricating features in sub-micron
dimensions. Major advantages of this technique are the elimination of mask, cost …
dimensions. Major advantages of this technique are the elimination of mask, cost …
A microfluidics-assisted photopolymerization method for high-resolution multimaterial 3D printing
Abstract 3D printing and bioprinting are recognized as key technologies for the construction
of complex micro-devices, micro-environments, and culture models. Thanks to their potential …
of complex micro-devices, micro-environments, and culture models. Thanks to their potential …
[HTML][HTML] Fabrication of pyrolytic carbon interdigitated microelectrodes by maskless UV photolithography with epoxy-based photoresists SU-8 and mr-DWL
Maskless UV photolithography is increasingly used, especially in research environments
where low turn-around time for new designs improves productivity. Here, we fabricate …
where low turn-around time for new designs improves productivity. Here, we fabricate …
Direct UV laser writing system to photolithographically fabricate optimal microfluidic geometries: Experimental investigations
Ultraviolet (UV) photolithography is utilised to obtain required geometric features on a
substrate coated with photosensitive polymer by impinging beam of UV light. Using this …
substrate coated with photosensitive polymer by impinging beam of UV light. Using this …
Theoretical study of micro-structure fabrication by multi-beam laser interference lithography with different polarization combinations
X Wang, T Jia, J Zhu, Y Su, L Zhang, H Yang… - … Physics Letters B, 2021 - World Scientific
In this study, we systematically and comprehensively investigated the influence of
polarization angle on the fabrication of micro-structures by multi-beam laser interference …
polarization angle on the fabrication of micro-structures by multi-beam laser interference …
Direct laser writing lithography using a negative-tone electron-beam resist
We used a negative-tone e-beam resist (N-ER) to perform direct laser writing lithography
based on a single-photon absorption process with a 405-nm laser source. The linewidth of …
based on a single-photon absorption process with a 405-nm laser source. The linewidth of …
A COMPARATIVE STUDY ON THE PHOTORESIST PATTERNING OF GLASS AND SILICON WITH MICROHOLES VIA MASKLESS PHOTOLITHOGRAPHY
F Güçlüer, F Keleş - Eurasian Journal of Science Engineering and …, 2022 - dergipark.org.tr
Maskless photolithography, a useful tool used in patterning the photoresist which acts as a
mask prior to the actual etching process of substrate, has attracted attention mainly due to …
mask prior to the actual etching process of substrate, has attracted attention mainly due to …
[HTML][HTML] Studying the impact of depth of focus on 3D profile of negative photoresist material: a simulation approach
For quality patterning of microstructures, it is essential that all process parameters are
optimized to ensure well-developed 3D profile of the resist. Advances in direct laser …
optimized to ensure well-developed 3D profile of the resist. Advances in direct laser …
[引用][C] Experimental Studies on Droplet Based Microfluidic Devices for Analytical Applications
S Srikanth - 2022 - shodhganga.inflibnet.ac.in
Shodhganga@INFLIBNET: Experimental Studies on Droplet Based Microfluidic Devices for
Analytical Applications Skip navigation DSpace logo Home Browse Universities & Departments …
Analytical Applications Skip navigation DSpace logo Home Browse Universities & Departments …