Novel fluorinated aromatic polyimides were prepared by the conventional two-step
imidization of 4.4′-(hexafluoroisopropylidene) diphthalic anhydride (6FDA) and diamines …

DC/RF plasma sputtering process for the growth of copper oxide thin film was studied by
optical emission spectroscopy. The films were produced by a balanced magnetron …

This study aims at synthesizing highly transparent and hard fluorine doped silicon oxide
films by tetraethylorthosilicate-oxygen-tetrafluoromethane plasma polymerization. The films …

The design and preparation of conventional optical films are mainly limited by the refractive
indices of available materials. Here, a simple-operation antireflection coatings (ARCs) …

In this study, we fabricated an optically transparent and flexible SiNx/SiOF/SiNx (NFN)
moisture barrier film using a highly hygroscopic fluorine‐doped silicon oxide (SiOF) thin film …

The plasma process in the deposition of cupric oxide (CuO) film was investigated. The films
were synthesized by balanced radio frequency magnetron sputtering. The Effect of substrate …

Structural and optical properties of low refractive index fluorinated silica (SiO x C y F z) films
were investigated. The films were deposited on p-type silicon and polycarbonate substrates …

Plasma-enhanced chemical vapor deposition (PECVD) technique is well suited for
fabricating optical filters with continuously variable refractive index profiles; however, it is not …

The mechanical behavior of the high transparent fluorine doped silicon oxide thin films was
studied by nanoindentation and nanoscratching analysis. The films were deposited by …

The plasma-enhanced chemical vapor deposition (PECVD) technique is well suited for
fabricating optical filters with continuously variable refractive index profiles; however, it is not …