Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology
Ellipsometric scatterometry has gained wide industrial applications in semiconductor
manufacturing after ten years of development. Among the various types of ellipsometers …
manufacturing after ten years of development. Among the various types of ellipsometers …
Regularized pseudo-phase imaging for inspecting and sensing nanoscale features
Recovering tiny nanoscale features using a general optical imaging system is challenging
because of poor signal to noise ratio. Rayleigh scattering implies that the detectable signal …
because of poor signal to noise ratio. Rayleigh scattering implies that the detectable signal …
Robust solution to the inverse problem in optical scatterometry
In optical scatterometry, the least squares (LSQ) function is usually used as the objective
function to quantify the difference between the calculated and measured signatures, which is …
function to quantify the difference between the calculated and measured signatures, which is …
Determination of an optimal measurement configuration in optical scatterometry using global sensitivity analysis
In optical scatterometry, a proper measurement configuration has a significant impact on the
precision of the reconstructed profile parameters beyond the quality of the measured …
precision of the reconstructed profile parameters beyond the quality of the measured …
Improved deep-etched multilayer grating reconstruction by considering etching anisotropy and abnormal errors in optical scatterometry
Accurate, fast, and nondestructive reconstruction of the etched nanostructures is important
for etching process control to achieve good fidelity, as well as high manufacturing yield. In …
for etching process control to achieve good fidelity, as well as high manufacturing yield. In …
Inverse optical scatterometry using sketch-guided deep learning
Optical scatterometry, also referred to as optical critical dimension (OCD) metrology, is a
widely used technique for characterizing nanostructures in semiconductor industry. As a …
widely used technique for characterizing nanostructures in semiconductor industry. As a …
Neural network driven sensitivity analysis of diffraction-based overlay metrology performance to target defect features
K Wang, K Meng, H Zhang, P Lou - Measurement Science and …, 2024 - iopscience.iop.org
Overlay (OVL) is one significant performance indicator for the lithography process control in
semiconductor manufacturing. The accuracy of the OVL metrology is extremely critical for …
semiconductor manufacturing. The accuracy of the OVL metrology is extremely critical for …
Dependence-analysis-based data-refinement in optical scatterometry for fast nanostructure reconstruction
Optical scatterometry is known as a powerful tool for nanostructure reconstruction due to its
advantages of being non-contact, non-destructive, low cost, and easy to integrate. As a …
advantages of being non-contact, non-destructive, low cost, and easy to integrate. As a …
[PDF][PDF] 基于灵敏度分析的一维纳米结构光学散射
董正琼， 刘世元， 陈修国， 石雅婷， 张传维… - 红外与毫米波 …, 2016 - journal.sitp.ac.cn
纳米制造是指产品特征尺寸为纳米量级的制造技术, 即特征尺寸在! 00 1& 以内的制造技术$
为了实现纳米制造工艺的可操纵性, 可预测性, 可重复性和可扩M 性, 保证基于纳米科技的产品 …
为了实现纳米制造工艺的可操纵性, 可预测性, 可重复性和可扩M 性, 保证基于纳米科技的产品 …
[PDF][PDF] 基于光学散射仪的T 型相变存储器三维形貌参数测量
董正琼， 袁顺， 李晨阳， 唐少康， 聂磊 - Laser & Optoelectronics …, 2022 - researching.cn
摘要T 型相变存储器的低功耗, 非易失性, 高存储密度和高可靠性等优势使其被国际半导体工业
协会认为是下一代半导体存储器的主流产品之一. 为了保证T 型相变存储器制造工艺的可控性 …
协会认为是下一代半导体存储器的主流产品之一. 为了保证T 型相变存储器制造工艺的可控性 …