Recent progress in group III-nitride nanostructures: From materials to applications

F Chen, X Ji, SP Lau - Materials Science and Engineering: R: Reports, 2020 - Elsevier
Group-III-nitride semiconductors, including AlN, GaN, InN and their ternary, quaternary
compounds, are promising electronic and optoelectronic materials for the applications in …

Toward smart and ultra‐efficient solid‐state lighting

JY Tsao, MH Crawford, ME Coltrin… - Advanced Optical …, 2014 - Wiley Online Library
Solid‐state lighting has made tremendous progress this past decade, with the potential to
make much more progress over the coming decade. In this article, the current status of solid …

Growth and applications of group III-nitrides

O Ambacher - Journal of physics D: Applied physics, 1998 - iopscience.iop.org
Recent research results pertaining to InN, GaN and AlN are reviewed, focusing on the
different growth techniques of Group III-nitride crystals and epitaxial films, heterostructures …

When group-III nitrides go infrared: New properties and perspectives

J Wu - Journal of applied physics, 2009 - pubs.aip.org
Wide-band-gap GaN and Ga-rich InGaN alloys, with energy gaps covering the blue and
near-ultraviolet parts of the electromagnetic spectrum, are one group of the dominant …

GaN: Processing, defects, and devices

SJ Pearton, JC Zolper, RJ Shul, F Ren - Journal of applied physics, 1999 - pubs.aip.org
The role of extended and point defects, and key impurities such as C, O, and H, on the
electrical and optical properties of GaN is reviewed. Recent progress in the development of …

[图书][B] Semiconductor surfaces and interfaces

W Mönch - 2013 - books.google.com
Semiconductor Surfaces and Interfaces deals with structural and electronic properties of
semiconductor surfaces and interfaces. The first part introduces the general aspects of …

Indium nitride (InN): A review on growth, characterization, and properties

AG Bhuiyan, A Hashimoto, A Yamamoto - Journal of applied physics, 2003 - pubs.aip.org
During the last few years the interest in the indium nitride (InN) semiconductor has been
remarkable. There have been significant improvements in the growth of InN films. High …

Sub-nanometer ultrathin epitaxy of AlGaN and its application in efficient doping

J Wang, M Wang, F Xu, B Liu, J Lang… - Light: Science & …, 2022 - nature.com
Solving the doping asymmetry issue in wide-gap semiconductors is a key difficulty and long-
standing challenge for device applications. Here, a desorption-tailoring strategy is proposed …

[PDF][PDF] Recent progress in metal-organic chemical vapor deposition of N-polar group-III nitrides

S Keller, H Li, M Laurent, Y Hu, N Pfaff… - Semiconductor …, 2014 - researchgate.net
Progress in metal-organic chemical vapor deposition of high quality () 0001 N-polar (Al, Ga,
In) N films on sapphire, silicon carbide and silicon substrates is reviewed with focus on key …

N-polar GaN epitaxy and high electron mobility transistors

MH Wong, S Keller, SD Nidhi… - Semiconductor …, 2013 - iopscience.iop.org
This paper reviews the progress of N-polar ($000\mathop 1\limits^\_ $) GaN high frequency
electronics that aims at addressing the device scaling challenges faced by GaN high …