Plasma under control: Advanced solutions and perspectives for plasma flux management in material treatment and nanosynthesis

O Baranov, K Bazaka, H Kersten, M Keidar… - Applied Physics …, 2017 - pubs.aip.org
A wide range of material treatment and nanosynthesis technologies can be significantly
enhanced by the use of a plasma-based process environment, with the benefits ranging …

[HTML][HTML] Comparative study of tribological behavior of TiN hard coatings deposited by various PVD deposition techniques

P Panjan, A Drnovšek, P Terek, A Miletić, M Čekada… - Coatings, 2022 - mdpi.com
In this paper, we present a comparative study of tribological properties of TiN coatings
deposited by low-voltage electron beam evaporation, magnetron sputtering and cathodic arc …

Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering

L Mascaretti, T Barman, BR Bricchi, F Münz… - Applied Surface …, 2021 - Elsevier
Titanium nitride (TiN) is a promising plasmonic material alternative to gold and silver thanks
to its refractory character, low resistivity (< 100 µΩ cm) and compatibility with microelectronic …

Stress and texture in HIPIMS TiN thin films

R Machunze, AP Ehiasarian, FD Tichelaar, G Janssen - Thin Solid Films, 2009 - Elsevier
Titanium nitride (TiN) films in the thickness range of 0.013 µm to 0.3 µm were grown by high
power impulse magnetron sputtering (HIPIMS) on silicon substrates in two deposition …

Mechanical properties of TiN deposited in synchronous bias mode through high-power impulse magnetron sputtering

JF Tang, SY Huang, JH Lin, FC Yang… - Surface and Coatings …, 2022 - Elsevier
Single or doubly ionized metal and gas ions (ie, N+, N 2+, Ti+, Ti 2+, Ar+) in the HiPIMS
plasma discharge of Ti contribute multiple functions, and the dissociated ions that arrive on a …

Mechanical and tribological properties related on the texture of TiN films regulated via HiPIMS

H Gao, B Zhang, P Yang, Z Wang, N Zhou… - Chemical Physics …, 2023 - Elsevier
Since H/E represents elastic strain to failure and H 3//E 2 represents the resist to plastic
deformation, both ratios assure the tribology properties. In this study, at very first time …

Structure and properties of CaO-and ZrO2-doped TiCxNy coatings for biomedical applications

DV Shtansky, EA Levashov, NA Glushankova… - Surface and Coatings …, 2004 - Elsevier
In the present work multicomponent thin films based on the systems Ti–Ca–C–O–N and Ti–
Zr–C–O–N have been deposited and evaluated. TiC0. 5+ 10% CaO and TiC0. 5+ 10% ZrO2 …

Effect of target frequency, bias voltage and bias frequency on microstructure and mechanical properties of pulsed DC CFUBM sputtered TiN coating

D Bhaduri, A Ghosh, S Gangopadhyay… - Surface and Coatings …, 2010 - Elsevier
Pulsed magnetron sputtering is well known since early 1990s for offering high process
stability, improved coating quality, higher plasma density and high bias current. Target …

[HTML][HTML] Role of substrate and deposition conditions on the texture evolution of titanium nitride thin film on bare and plasma-nitrided high-speed steel

P Saikia, A Joseph, R Rane, BK Saikia… - Journal of Theoretical …, 2013 - Springer
Titanium nitride (TiN) films are prepared by direct current (DC) magnetron sputtering of a
titanium (Ti) target in an argon (Ar)+ nitrogen (N 2) atmosphere on bare and pulsed DC …

Unbalanced magnetic field configuration: plasma and film properties

SE Rodil, JJ Olaya - Journal of Physics: Condensed Matter, 2006 - iopscience.iop.org
Abstract Coatings of CrN, TiN, ZrN, TaN and NbN were deposited using an unbalanced
magnetron sputtering system with two different degrees of unbalancing to investigate the …