Ion irradiation is a key tool for controlling the nanostructure, phase content, and physical
properties of refractory ceramic thin films grown at low temperatures by magnetron …

Ion-irradiation-induced changes in structure, elastic properties, and thermal stability of
metastable c-(Ti, Al) N thin films synthesized by high-power pulsed magnetron sputtering …

Ion irradiation-induced changes in the structure and mechanical properties of metastable
cubic (V, Al) N deposited by reactive high power pulsed magnetron sputtering are …

Up until recently, thin film growth by magnetron sputtering relied on enhancing adatom
mobility in the surface region by gas-ion irradiation to obtain dense layers at low deposition …

The influence of changes induced by ion irradiation on structure and thermal stability of
metastable cubic (Ti, Al) N coatings deposited by cathodic arc evaporation is systematically …

Thin films are ubiquitous in modern technology and highly useful in materials discovery and
design. For achieving optimal extrinsic properties, their microstructure needs to be controlled …

Motivated by frequently reported deviations from stoichiometry in cubic transition metal
nitride (TMN x) thin films, the effect of N-vacancy concentration on the elastic properties of …

Metastable titanium aluminum nitride coatings are widely applied in cutting and forming
applications. Although it is generally accepted that the phase formation of metastable TiAlN …

Metastable transition metal aluminum nitride (TMAlN, TM= Ti, V) thin films are today
deposited utilizing ionized vapor phase condensation techniques where variations in ion …

A study on the plasma-enhanced atomic layer deposition of amorphous inorganic oxides
SiO2 and Al2O3 on polypropylene (PP) was carried out with respect to growth taking place …