In order to manufacture large-scale photonic devices of various dimensions at a low cost, a
number of patterning techniques have been developed. Nanoimprint lithography is among …

Technologies for micro-to-nanometer patterns of solution-based materials (SBMs) contribute
to a wide range of practical applications in the fields of electronics and optoelectronics …

The conventional bulk heterojunction (BHJ) structure is widely used for fabricating high-
performance organic solar cells (OSCs) due to the nanometer-scale phase separation of the …

Aggregates–that is short‐ranged ordered moieties in the solid‐state of π‐conjugated
polymers–play an important role in the photophysics and performance of various …

An approach to ultraviolet (UV) nanoimprint lithography using a cyclodextrin-based porous
template was investigated for the reduction of air trapping and template damage caused by …

Large-area nanoimprint lithography (NIL) has been regarded as one of the most promising
micro/nano-manufacturing technologies for mass production of large-area micro/nanoscale …

A comprehensive study on inverted organic solar cells (OSCs) with a moth's eye
nanostructured (MEN) active layer was carried out. Performance of the MEN-based OSCs …

Direct laser interference patterning (DLIP) is used to fabricate large-area, periodic surface
patterns on Sb 2 S 3 substrates to enhance the performance of solar cells. Comparing the …

In this work, strong chain alignment in large molecular weight polymer solar cells is for the
first time demonstrated by nanoimprint lithography (NIL). The polymer crystallizations in …

Nanostructures with sufficiently large areas are necessary for the development of practical
devices. Current efforts to fabricate large-area nanostructures using step-and-repeat …