Titanium dioxide thin films were prepared using two types of magnetron sputtering
processes: conventional and with modulated plasma. The films were deposited on SiO2 and …

In this work results of hardness investigations of nanocrystalline TiO 2 thin films are
presented. Thin films were prepared by low pressure hot target reactive sputtering …

In this paper structural, optical, photoluminescence, and photocatalytic properties of TiO2
and TiO2:(2.6 at.% Tb) thin films have been compared. Thin films were prepared by high …

In this work the influence of annealing on structural properties and photoluminescence
efficiency of TiO 2 thin films doped with 0.2 at.% of Eu was described. Coatings were as …

TiO 2 thin films doped with neodymium in the range from 0.6 at.% to 6.1 at.% were prepared
by high energy reactive magnetron sputtering. Investigations of structural properties …

This work is focused on structural and optical properties of TiO< sub> 2 thin films doped with
different amount of terbium. The thin films have been prepared by high energy reactive …

Titanium dioxide thin films, each doped with the same amount of neodymium (1 at.%) were
deposited by Low Pressure Hot Target Reactive Sputtering and High Energy Reactive …

In this work modification of TiO 2 thin films structure by doping with europium was described.
Nanocrystalline films were prepared by high energy magnetron sputtering process. The …

In this work the nanocrystalline TiO_2 thin films doped with vanadium in amount of 19 at.%
and 23 at.% prepared by magnetron sputtering method have been presented. The …

TiO2 thin films were grown on silicon substrates using an electron-beam evaporator. Grainy
TiO was used as the evaporation material. Temperature substrate during TiO2 growth was …