GaN-based light-emitting diodes on various substrates: a critical review
G Li, W Wang, W Yang, Y Lin, H Wang… - Reports on Progress …, 2016 - iopscience.iop.org
GaN and related III-nitrides have attracted considerable attention as promising materials for
application in optoelectronic devices, in particular, light-emitting diodes (LEDs). At present …
application in optoelectronic devices, in particular, light-emitting diodes (LEDs). At present …
Recent progress in red light-emitting diodes by III-nitride materials
GaN-based light-emitting devices have the potential to realize all visible emissions with the
same material system. These emitters are expected to be next-generation red, green, and …
same material system. These emitters are expected to be next-generation red, green, and …
[HTML][HTML] Growth of strain-relaxed InGaN on micrometer-sized patterned compliant GaN pseudo-substrates
The compliant behavior of high fill-factor 10× 10 μm 2 square patterned 60–140 nm thick
GaN-on-porous-GaN tiles was demonstrated by utilizing porous GaN as a semi-flexible …
GaN-on-porous-GaN tiles was demonstrated by utilizing porous GaN as a semi-flexible …
Carrier dynamics at trench defects in InGaN/GaN quantum wells revealed by time-resolved cathodoluminescence
Time-resolved cathodoluminescence offers new possibilities for the study of semiconductor
nanostructures–including defects. The versatile combination of time, spatial, and spectral …
nanostructures–including defects. The versatile combination of time, spatial, and spectral …
The impact of trench defects in InGaN/GaN light emitting diodes and implications for the “green gap” problem
The impact of trench defects in blue InGaN/GaN light emitting diodes (LEDs) has been
investigated. Two mechanisms responsible for the structural degradation of the multiple …
investigated. Two mechanisms responsible for the structural degradation of the multiple …
Manipulation of nanoscale V-pits to optimize internal quantum efficiency of InGaN multiple quantum wells
We systematically investigated the influence of nanoscale V-pits on the internal quantum
efficiency (IQE) of InGaN multiple quantum wells (MQWs) by adjusting the underlying …
efficiency (IQE) of InGaN multiple quantum wells (MQWs) by adjusting the underlying …
Compliant micron-sized patterned InGaN pseudo-substrates utilizing porous GaN
The compliant behavior of densely packed 10× 10 µm2 square patterned InGaN layers on
top of porous GaN is demonstrated. The elastic relaxation of the InGaN layers is enabled by …
top of porous GaN is demonstrated. The elastic relaxation of the InGaN layers is enabled by …
Segregation of In to dislocations in InGaN
MK Horton, S Rhode, SL Sahonta, MJ Kappers… - Nano …, 2015 - ACS Publications
Dislocations are one-dimensional topological defects that occur frequently in functional thin
film materials and that are known to degrade the performance of In x Ga1–x N-based …
film materials and that are known to degrade the performance of In x Ga1–x N-based …
Progress and prospects of III-nitride optoelectronic devices adopting lift-off processes
Lift-off processes have been developed as the enabling technology to free the epitaxial III-
nitride thin film from a conventional growth substrate such as sapphire and silicon in order to …
nitride thin film from a conventional growth substrate such as sapphire and silicon in order to …
Formation of a-type dislocations near the InGaN/GaN interface during post-growth processing of epitaxial structures
J Moneta, G Staszczak, E Grzanka… - Journal of Applied …, 2023 - pubs.aip.org
Cross-sectional transmission electron microscopy studies often reveal a-type dislocations
located either below or above the interfaces in InGaN/GaN structures deposited along the …
located either below or above the interfaces in InGaN/GaN structures deposited along the …