Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many
applications owing to its distinct abilities. They include uniform deposition of conformal films …

Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Lithium‐ion batteries (LIBs) are used widely in today's consumer electronics and offer great
potential for hybrid electric vehicles (HEVs), plug‐in HEVs, pure EVs, and also in smart grids …

Atomic layer deposition (ALD) is a thin film technology that in the past two decades rapidly
developed from a niche technology to an established method. It proved to be a key …

Atomic layer deposition (ALD) is a cyclic process which relies on sequential self-terminating
reactions between gas phase precursor molecules and a solid surface. The self-limiting …

A single nanopore structure that embeds all components of an electrochemical storage
device could bring about the ultimate miniaturization in energy storage. Self-alignment of …

Within its rich phase diagram titanium dioxide is a truly multifunctional material with a
property palette that has been shown to span from dielectric to transparent-conducting …

Atomic layer deposition (ALD) has been employed as a new synthetic route to thin films of
cobalt sulfide on silicon and fluorine-doped tin oxide platforms. The self-limiting nature of the …

An electrochemical energy storage system with high energy density, stringent safety, and
reliability is highly desirable for next-generation energy storage devices. Here an aqueous …

A new atomic layer deposition (ALD) process for V2O5 using ozone (O3) as oxidant has
been developed that resulted in crystalline V2O5 thin films which are single-phase and …