Low magnetic damping of ferrimagnetic GdFeCo alloys

DH Kim, T Okuno, SK Kim, SH Oh, T Nishimura… - Physical review …, 2019 - APS
We investigate the Gilbert damping parameter α for rare earth (RE)–transition metal (TM)
ferrimagnets over a wide temperature range. Extracted from the field-driven magnetic …

Crossing frequency method applicable to intermediate pressure plasma diagnostics using the cutoff probe

S Kim, J Lee, Y Lee, C Cho, S You - Sensors, 2022 - mdpi.com
Although the recently developed cutoff probe is a promising tool to precisely infer plasma
electron density by measuring the cutoff frequency (f cutoff) in the S 21 spectrum, it is …

Flat cutoff probe for real-time electron density measurement in industrial plasma processing

HJ Yeom, JH Kim, DH Choi, ES Choi… - Plasma Sources …, 2020 - iopscience.iop.org
The microwave cutoff probe (CP) is an accurate diagnostic technique to measure absolute
electron density even in processing gas plasmas. Because this technique needs the …

Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2

Y Lee, S Kim, J Lee, C Cho, I Seong, S You - Sensors, 2022 - mdpi.com
As low-temperature plasma plays an important role in semiconductor manufacturing, plasma
diagnostics have been widely employed to understand changes in plasma according to …

Efficient spin transport through native oxides of nickel and permalloy with platinum and gold overlayers

BL Zink, M Manno, L O'Brien, J Lotze, M Weiler… - Physical Review B, 2016 - APS
We present measurements of spin pumping detected by the inverse spin Hall effect voltage
and ferromagnetic resonance spectroscopy in a series of metallic ferromagnet/normal metal …

Analysis of the transmission spectrum of the microwave cutoff probe influenced by the sheath around the probe

HJ Yeom, YG Kim, GS Chae, DY Hwang… - Journal of Applied …, 2023 - pubs.aip.org
We investigated the effect of the sheath around the probe tips on the transmission spectrum
of a cutoff probe using an electromagnetic simulation and a circuit model. Our results show …

Investigation into SiO2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled

W Jeong, Y Lee, C Cho, I Seong, S You - Nanomaterials, 2022 - mdpi.com
SiO2 etching characteristics were investigated in detail. Patterned SiO2 was etched using
radio-frequency capacitively coupled plasma with pulse modulation in a mixture of argon …

A transmission line model of the cutoff probe

SJ Kim, JJ Lee, DW Kim, JH Kim… - Plasma Sources Science …, 2019 - iopscience.iop.org
The previously proposed circuit model has proven to be a powerful tool to analyze and
improve the characteristics of the cutoff probe. This model revealed the mechanism of …

[HTML][HTML] Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2

Y Lee, I Seong, J Lee, S Lee, C Cho, S Kim… - Journal of Vacuum …, 2022 - pubs.aip.org
Recently, fluorocarbon (FC) film deposition on a SiO 2 surface has become one of the most
important processes in semiconductor manufacturing because the formation of a passivation …

Measurement and analysis of electron-neutral collision frequency in the calibrated cutoff probe

KH You, SJ You, DW Kim, BK Na, BH Seo, JH Kim… - Physics of …, 2016 - pubs.aip.org
As collisions between electrons and neutral particles constitute one of the most
representative physical phenomena in weakly ionized plasma, the electron-neutral (en) …