GaN FinFETs and trigate devices for power and RF applications: Review and perspective

Y Zhang, A Zubair, Z Liu, M Xiao… - Semiconductor …, 2021 - iopscience.iop.org
Gallium nitride (GaN) is becoming a mainstream semiconductor for power and radio-
frequency (RF) applications. While commercial GaN devices are increasingly being adopted …

Selective area regrowth and doping for vertical gallium nitride power devices: Materials challenges and recent progress

H Fu, K Fu, C Yang, H Liu, KA Hatch, P Peri… - Materials Today, 2021 - Elsevier
This paper reviews materials challenges and recent progress for selective area regrowth
and doping for vertical gallium nitride (GaN) power devices. The purpose is to realize …

(Ultra) wide-bandgap vertical power FinFETs

Y Zhang, T Palacios - IEEE Transactions on Electron Devices, 2020 - ieeexplore.ieee.org
FinFET is the backbone device technology for CMOS electronics at deeply scaled
technology nodes per Moore's law. Recently, the FinFET concept has been leveraged to …

Vertical GaN power devices: Device principles and fabrication technologies—Part II

H Fu, K Fu, S Chowdhury, T Palacios… - IEEE Transactions on …, 2021 - ieeexplore.ieee.org
Vertical gallium nitride (GaN) power devices are enabling next-generation power electronic
devices and systems with higher energy efficiency, higher power density, faster switching …

Lateral p-GaN/2DEG junction diodes by selective-area p-GaN trench-filling-regrowth in AlGaN/GaN

M Xiao, Z Du, J Xie, E Beam, X Yan, K Cheng… - Applied Physics …, 2020 - pubs.aip.org
This work demonstrates a lateral pn junction diode formed between the two-dimensional
electron gas (2DEG) and the selective-area regrown p-GaN in AlGaN/GaN. Benefiting from …

GaN vertical-channel junction field-effect transistors with regrown p-GaN by MOCVD

C Yang, H Fu, VN Kumar, K Fu, H Liu… - … on Electron Devices, 2020 - ieeexplore.ieee.org
We report an experimental demonstration of GaN-based vertical-channel junction field-effect
transistors (VC-JFETs). A p-GaN regrowth by metalorganic chemical vapor deposition …

Origin of leakage current in vertical GaN devices with nonplanar regrown p-GaN

M Xiao, X Yan, J Xie, E Beam, Y Cao, H Wang… - Applied Physics …, 2020 - pubs.aip.org
This work demonstrates large-area vertical GaN-on-GaN Schottky barrier diodes (SBDs)
with different p-GaN terminations fabricated by the p-GaN regrowth on planar and nonplanar …

Selective area doping of GaN toward high-power applications

RA Ferreyra, B Li, S Wang, J Han - Journal of Physics D: Applied …, 2023 - iopscience.iop.org
Selective area doping in GaN, especially p-type, is a critical and inevitable building block for
the realization of advanced device structures for high-power applications, including, but not …

Determination of electronic band structure by electron holography of etched-and-regrown interfaces in GaN pin diodes

SR Alugubelli, H Fu, K Fu, H Liu, Y Zhao… - Applied Physics …, 2019 - pubs.aip.org
The electrostatic potential variation across etched-and-regrown GaN pin diodes for power
electronics has been studied using electron holography in a transmission electron …

Interfacial Impurities and Their Electronic Signatures in High‐Voltage Regrown Nonpolar m‐Plane GaN Vertical p–n Diodes

A Aragon, M Monavarian, I Stricklin… - … status solidi (a), 2020 - Wiley Online Library
Impacts of silicon, carbon, and oxygen interfacial impurities on the performance of high‐
voltage vertical GaN‐based p–n diodes are investigated. The results indicate that moderate …