Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Within its rich phase diagram titanium dioxide is a truly multifunctional material with a
property palette that has been shown to span from dielectric to transparent-conducting …

This paper reviews several high‐k ALD processes potentially applicable to the production of
capacitors, concentrating on very recent developments. A list of the dielectric materials …

We studied the growth of TiO2 by liquid injection atomic layer deposition (ALD) utilizing two
different amide-based titanium sources, tetrakis-dimethylamido-titanium [(NMe2) 4-Ti …

The use of thin-films made by atomic layer deposition (ALD) is increasing in the field of
optical sensing. ALD TiO 2 has been widely characterized for its physical and optical …

Atomic layer deposition of aluminum–titanium oxide films from different precursor
combinations was investigated. In addition to well-known TiCl 4–H 2 O, AlCl 3–H 2 O and Al …

Mechanical properties of atomic-layer deposited alumina thin films containing amorphous, α-
Al 2 O 3, θ-Al 2 O 3, δ-Al 2 O 3 and γ-Al 2 O 3 phases were characterized. To initiate the α-Al …

Film conformality is one of the major drivers for the interest in atomic layer deposition (ALD)
processes. This work presents new silicon-based microscopic lateral high-aspect-ratio …

We studied the atomic layer deposition (ALD) of titanium oxide (TiO2) thin films using a
newly developed heteroleptic titanium precursor with a linked ligand. The titanium …

At the nanoscale, bone consists of a hierarchical structure of mineral crystals (hard material)
and collagen (soft material). Inspired by bone's nanoscale structure and properties, we …